Investigation of growth parameters for ScAlN-barrier HEMT structures by plasma-assisted MBE

K Frei, R Trejo-Hernández, S Schütt… - Japanese Journal of …, 2019 - iopscience.iop.org
Due to its outstanding polarization properties and the possibility of lattice-matched growth on
GaN, Sc x Al 1-x N is a promising material among group III nitrides providing a wide field of …

Effect of two step GaN buffer on the structural and electrical characteristics in AlGaN/GaN heterostructure

A Pandey, VK Singh, S Dalal, RK Bag, K Narang… - Vacuum, 2020 - Elsevier
AlGaN/GaN hetero-structure based High electron mobility transistor (HEMT) is one of the
emerged electronic devices for high power and high frequency applications. In this report …

Transfer of AlGaN/GaN RF-devices onto diamond substrates via van der Waals bonding

T Gerrer, V Cimalla, P Waltereit, S Müller… - International Journal of …, 2018 - cambridge.org
We present a novel bonding process for gallium nitride-based electronic devices on
diamond heat spreaders. In the proposed technology, GaN devices are transferred from …

Dislocation density investigation on MOCVD-grown GaN epitaxial layers using wet and dry defect selective etching

A Pandey, BS Yadav, DVS Rao, D Kaur, AK Kapoor - Applied Physics A, 2016 - Springer
Results on the investigations of the dislocation etch pits in the GaN layers grown on
sapphire substrate by metal organic chemical vapor deposition are revealed by wet …

Source of two-dimensional electron gas in unintentionally doped AlGaN/GaN multichannel high-electron-mobility transistor heterostructures

R Lingaparthi, N Dharmarasu, K Radhakrishnan… - Applied Physics …, 2021 - pubs.aip.org
Unintentionally doped (UID) AlGaN/GaN-based multichannel high electron mobility
transistor (MC-HEMT) heterostructures have been demonstrated on the SiC substrate using …

Pulsed laser deposition of hexagonal GaN-on-Si (100) template for MOCVD applications

KC Shen, MC Jiang, HR Liu, HH Hsueh, YC Kao… - Optics express, 2013 - opg.optica.org
Growth of hexagonal GaN on Si (100) templates via pulsed laser deposition (PLD) was
investigated for the further development of GaN-on-Si technology. The evolution of the GaN …

In-situ stress evolution and its correlation with structural characteristics of GaN buffer grown on Si substrate using AlGaN/AlN/GaN stress mitigation layers for high …

R Lingaparthi, N Dharmarasu, K Radhakrishnan… - Thin Solid Films, 2020 - Elsevier
In-situ stress evolution as a function of thickness has been investigated and correlated with
the structural properties and surface morphology of GaN buffer layer grown on …

The impact of GaN/substrate thermal boundary resistance on a HEMT device

HC Nochetto, NR Jankowski… - ASME …, 2011 - asmedigitalcollection.asme.org
The present work uses finite element thermal simulations of Gallium Nitride High Electron
Mobility Transistors (GaN HEMTs) to evaluate the impact of device design parameters on the …

A study on GaSi interdiffusion during (Al) GaN/AlN growth on Si by plasma assisted molecular beam epitaxy

Y Zheng, M Agrawal, N Dharmarasu… - Applied Surface …, 2019 - Elsevier
The Gasingle bondSi interdiffusion during (Al) GaN/AlN growth on Si substrate by plasma
assisted molecular beam epitaxy (PA-MBE) is studied. The epilayers were grown using a …

[图书][B] Nano-semiconductors: devices and technology

K Iniewski - 2018 - taylorfrancis.com
With contributions from top international experts from both industry and academia, Nano-
Semiconductors: Devices and Technology is a must-read for anyone with a serious interest …