Scatterometry is a fast, precise and low cost way to determine the mean pitch and
dimensional parameters of periodic structures with lateral resolution of a few nanometer. It is …

Downscaling, miniaturization and 3D staking of the micro/nano devices are burgeoning
phenomena in the semiconductor industry which have posed sophisticated challenges in …

Grazing incidence X-ray fluorescence is a non-destructive technique for analyzing the
geometry and compositional parameters of nanostructures appearing eg in computer chips …

Periodic nanostructures are fundamental elements in optical instrumentation as well as
basis structures in integrated electronic circuits. Decreasing sizes and increasing complexity …

A lithographic manufacturing system produces periodic structures with feature sizes less
than 10 nm and a direction of periodicity (D). A beam of radiation (1904) having a range of …

Supplement one of the'Guide to the Expression of Uncertainties in Measurements
(GUM)'recommends to estimate measurement uncertainties by Monte Carlo calculations. For …

Smaller and more complex three-dimensional periodic nanostructures are part of the next
generation of integrated electronic circuits. Additionally, decreasing the dimensions of …

Scatterometry provides a fast indirect optical method for the determination of grating
geometry parameters of photomasks and is used in mask metrology. To obtain a desired …

Background: Scatterometry is a fast, indirect, and nondestructive optical method for quality
control in the production of lithography masks. To solve the inverse problem in compliance …

Geometrical dimensions in nanostructures can be determined through indirect optical
measurements carried out by a scatterometer. This includes solving a non-linear regression …