Analysis of p‐type SiOx layers as a boron diffusion source for n‐type c‐Si substrates

Determination of the oxygen content in amorphous SiOx thin films

AO Zamchiy, EA Baranov, IE Merkulova… - Journal of Non …, 2019 - Elsevier
The bonding structure and composition of amorphous silicon suboxide (a-SiO x, 0.25< x<
0.75) thin films deposited by gas-jet electron beam plasma chemical vapor deposition were …
被引用次数：35 相关文章 所有 3 个版本

Low work function intermetallic thin film as a back surface field material for hybrid solar cells

K Ge, J Chen, B Chen, Y Shen, J Guo, F Li, H Liu, Y Xu… - Solar Energy, 2018 - Elsevier
In this study, MgNd intermetallic is deposited as a thin film using magnetron sputtering.
Ultraviolet photoelectron spectroscopy (UPS) is employed to determine the work function of …
被引用次数：13 相关文章 所有 3 个版本

Ammonium tetraborate tetrahydrate as a new boron source for the fabrication of p-type emitters in silicon solar cell

Y Tang, J Hei, KF Wang, C Zhou - Solar Energy, 2022 - Elsevier
Ammonium tetraborate tetrahydrate (ATT,(NH 4) 2 B 4 O 5 (OH) 4· 2H 2 O) is proposed as a
new, inexpensive, and direct boron source that can achieve uniform diffusion at low …
被引用次数：1 相关文章 所有 2 个版本