Directed self-assembly of block copolymers by chemical or topographical guiding patterns: Optimizing molecular architecture, thin-film properties, and kinetics
W Li, M Müller - Progress in Polymer Science, 2016 - Elsevier
Patterning strategies based on directed self-assembly (DSA) of block copolymers, as one of
the most appealing next-generation lithography techniques, have attracted abiding interest …
the most appealing next-generation lithography techniques, have attracted abiding interest …
Block copolymer lithography
This Perspective addresses the current state of block copolymer lithography and identifies
key challenges and opportunities within the field. Significant strides in experimental and …
key challenges and opportunities within the field. Significant strides in experimental and …
Polarity-switching top coats enable orientation of sub–10-nm block copolymer domains
Block copolymers (BCPs) must necessarily have high interaction parameters (χ), a
fundamental measure of block incompatibility, to self-assemble into sub–10-nanometer …
fundamental measure of block incompatibility, to self-assemble into sub–10-nanometer …
Directed self-assembly of block copolymers for the fabrication of functional devices
Directed self-assembly of block copolymers is a bottom-up approach to nanofabrication that
has attracted high interest in recent years due to its inherent simplicity, high throughput, low …
has attracted high interest in recent years due to its inherent simplicity, high throughput, low …
Directed self-assembly of block copolymers for sub-10 nm fabrication
Y Chen, S Xiong - International Journal of Extreme Manufacturing, 2020 - iopscience.iop.org
Directed self-assembly (DSA) emerges as one of the most promising new patterning
techniques for single digit miniaturization and next generation lithography. DSA achieves …
techniques for single digit miniaturization and next generation lithography. DSA achieves …
Directed self-assembly of silicon-containing block copolymer thin films
The directed self-assembly (DSA) of lamella-forming poly (styrene-block-
trimethylsilylstyrene)(PS–PTMSS, L 0= 22 nm) was achieved using a combination of tailored …
trimethylsilylstyrene)(PS–PTMSS, L 0= 22 nm) was achieved using a combination of tailored …
Double-Patterned Sidewall Directed Self-Assembly and Pattern Transfer of Sub-10 nm PTMSS-b-PMOST
The directed self-assembly (DSA) of two sub-20 nm pitch silicon-containing block
copolymers (BCPs) was accomplished using a double-patterned sidewall scheme in which …
copolymers (BCPs) was accomplished using a double-patterned sidewall scheme in which …
From lab to fab: enabling enhanced control of block polymer thin-film nanostructures
Block polymer (BP) self-assembly is an ideal approach to generate periodic nanostructures
for thin-film applications such as nanolithography, ultrahigh-density memory storage …
for thin-film applications such as nanolithography, ultrahigh-density memory storage …
Impact of nanostructure on mechanical properties of norbornene-based block copolymers under simulated operating conditions for biobutanol membranes
C Ye, T Takigawa, O Burtovvy… - … Applied Materials & …, 2015 - ACS Publications
The structure and mechanical properties of a novel block copolymer (BCP) system with T g's
for both segments exceeding 300° C, poly (butylnorbornene)-block-poly …
for both segments exceeding 300° C, poly (butylnorbornene)-block-poly …
Simulation study of the effect of differences in block energy and density on the self-assembly of block copolymers
One of the potentially most important issues in accurately modeling directed self-assembly of
block copolymers (BCPs) is the fact that the real BCPs often have block energy and/or …
block copolymers (BCPs) is the fact that the real BCPs often have block energy and/or …