Monte Carlo modelling of noise in advanced III–V HEMTs

J Mateos, H Rodilla, BG Vasallo, T González - Journal of Computational …, 2015 - Springer
One of the main objectives of modern Microelectronics is the fabrication of devices with
increased cutoff frequency and decreased level of noise. At this moment, the best devices for …

Study on leakage current mechanism and band offset of high-k/n-InAlAs metal-oxide-semiconductor capacitors with HfO2 and HfAlO dielectric

H Guan, H Lv - Thin Solid Films, 2018 - Elsevier
To reduce the leakage current of InAs/AlSb HEMTs, deposition of a high-k dielectric is
required between the InAlAs protection layer and the gate electrode to form a metal-oxide …

[图书][B] Silicon doping profile measurement using terahertz time domain spectroscopy

CY Jen - 2014 - search.proquest.com
Doping profiles in silicon greatly determine electrical performances of microelectronic
devices and are frequently engineered to manipulate device properties. To support …

Small-signal modeling with direct parameter extraction for impact ionization effect in high-electron-mobility transistors

H Guan, H Lv, H Guo, Y Zhang - Journal of Applied Physics, 2015 - pubs.aip.org
Impact ionization affects the radio-frequency (RF) behavior of high-electron-mobility
transistors (HEMTs), which have narrow-bandgap semiconductor channels, and this …

An optimized fitting function with least square approximation in InAs/AlSb HFET small-signal model for characterizing the frequency dependency of impact ionization …

H Guan, H Guo - Chinese Physics B, 2017 - iopscience.iop.org
An enhanced small-signal model is introduced to model the influence of the impact
ionization effect on the performance of InAs/AlSb HFET, in which an optimized fitting function …

Improved modeling on the RF behavior of InAs/AlSb HEMTs

H Guan, H Lv, Y Zhang, Y Zhang - Solid-State Electronics, 2015 - Elsevier
The leakage current and the impact ionization effect causes a drawback for the performance
of InAs/AlSb HEMTs due to the InAs channel with a very narrow band gap of 0.35 eV. In this …

Investigation of performance of InAsSb based high electron mobility transistors (HEMTs)

MS Begum, J Vijayashree… - 2017 Devices for …, 2017 - ieeexplore.ieee.org
Investigation of performance of InAsSb based High Electron Mobility transistors (HEMTs) Page
1 978-1-5090-4724-6/17/$31.00 ©2017 IEEE Abstract— - In this paper the, Antimonide-based …

Analysis of noise performance in InAs DG-MOSHEMT

S Tamilselvi, S Tamilarasi… - 2017 Devices for …, 2017 - ieeexplore.ieee.org
In this paper the noise performance of double gate (DG) InAs MOS-HEMT with AI2O3
dielectric has been studied. In semiconductor devices noise occurs at near or critical …

Carrier dynamics probed by noise in high-frequency electronic devices

T González - 2015 International Conference on Noise and …, 2015 - ieeexplore.ieee.org
Electronic noise, despite being a limiting factor in many applications of semiconductor
devices and integrated circuits, constitutes also a source of information about the …

Carrier Dynamics Probed by Noise in High-Frequency Electronic Devices

T González Sánchez - 2015 - gredos.usal.es
Electronic noise, despite being a limiting factor in many applications of semiconductor
devices and integrated circuits, constitutes also a source of information about the …