Nanostructure design for drastic reduction of thermal conductivity while preserving high electrical conductivity
Y Nakamura - Science and Technology of advanced MaTerialS, 2018 - Taylor & Francis
The design and fabrication of nanostructured materials to control both thermal and electrical
properties are demonstrated for high-performance thermoelectric conversion. We have …
properties are demonstrated for high-performance thermoelectric conversion. We have …
Extremely dense arrays of germanium and silicon nanostructures
AA Shklyaev, M Ichikawa - Physics-Uspekhi, 2008 - iopscience.iop.org
Results of investigations into surface processes of the formation of germanium and silicon
nanostructures are analyzed. A mechanism of three-dimensional island nucleation and …
nanostructures are analyzed. A mechanism of three-dimensional island nucleation and …
[图书][B] Silicon Heterostructure Handbook: Materials, Fabrication, Devices, Circuits and Applications of SiGe and Si Strained-Layer Epitaxy
JD Cressler, S Monfray, G Freeman, D Friedman… - 2018 - taylorfrancis.com
An extraordinary combination of material science, manufacturing processes, and innovative
thinking spurred the development of SiGe heterojunction devices that offer a wide array of …
thinking spurred the development of SiGe heterojunction devices that offer a wide array of …
Phonon transport control by nanoarchitecture including epitaxial Ge nanodots for Si-based thermoelectric materials
S Yamasaka, Y Nakamura, T Ueda, S Takeuchi… - Scientific reports, 2015 - nature.com
Phonon transport in Si films was controlled using epitaxially-grown ultrasmall Ge nanodots
(NDs) with ultrahigh density for the purpose of developing Si-based thermoelectric materials …
(NDs) with ultrahigh density for the purpose of developing Si-based thermoelectric materials …
Thermoelectric power factor enhancement based on carrier transport physics in ultimately phonon-controlled Si nanostructures
We thoroughly investigated carrier and phonon transports related to thermoelectric
properties using absolutely-controlled Si nanostructures, namely Si films containing epitaxial …
properties using absolutely-controlled Si nanostructures, namely Si films containing epitaxial …
Observation of the quantum-confinement effect in individual Ge nanocrystals on oxidized Si substrates using scanning tunneling spectroscopy
Y Nakamura, K Watanabe, Y Fukuzawa… - Applied Physics …, 2005 - pubs.aip.org
Scanning tunneling spectroscopic studies revealed the quantum-confinement effects in Ge
nanocrystals formed with ultrahigh density 1012 cm− 2 by Ge deposition on ultrathin Si …
nanocrystals formed with ultrahigh density 1012 cm− 2 by Ge deposition on ultrathin Si …
Structural and electrical properties of silicon dioxide layers with embedded germanium nanocrystals grown by molecular beam epitaxy
A sheet of spherical, well-separated, crystalline Ge nanodots embedded in SiO 2 on top of a
p-(001) Si wafer was fabricated by molecular beam epitaxy (MBE) combined with rapid …
p-(001) Si wafer was fabricated by molecular beam epitaxy (MBE) combined with rapid …
Selective growth of Ge on Si(100) through vias of nanotemplate using solid source molecular beam epitaxy
We demonstrate that Ge can be selectively grown on Si (100) through openings in a SiO 2
nanotemplate by solid source molecular beam epitaxy. The selectivity relies on the thermal …
nanotemplate by solid source molecular beam epitaxy. The selectivity relies on the thermal …
Quantum-confinement effect in individual Ge1− xSnx quantum dots on Si (111) substrates covered with ultrathin SiO2 films using scanning tunneling spectroscopy
Y Nakamura, A Masada, M Ichikawa - Applied physics letters, 2007 - pubs.aip.org
The authors observed a quantum-confinement effect in individual Ge 1− x Sn x quantum
dots (QDs) on Si (111) substrates covered with ultrathin Si O 2 films using scanning …
dots (QDs) on Si (111) substrates covered with ultrathin Si O 2 films using scanning …
Dewetting behavior of Ge layers on SiO2 under annealing
AA Shklyaev, AV Latyshev - Scientific Reports, 2020 - nature.com
The solid-state dewetting phenomenon in Ge layers on SiO2 is investigated as a function of
layer thickness d Ge (from 10 to 86 nm) and annealing temperature. The dewetting is …
layer thickness d Ge (from 10 to 86 nm) and annealing temperature. The dewetting is …