GaN: Processing, defects, and devices

SJ Pearton, JC Zolper, RJ Shul, F Ren - Journal of applied physics, 1999 - pubs.aip.org
The role of extended and point defects, and key impurities such as C, O, and H, on the
electrical and optical properties of GaN is reviewed. Recent progress in the development of …

Group III nitride semiconductors for short wavelength light-emitting devices

JW Orton, CT Foxon - Reports on progress in physics, 1998 - iopscience.iop.org
The group III nitrides (AlN, GaN and InN) represent an important trio of semiconductors
because of their direct band gaps which span the range 1.95-6.2 eV, including the whole of …

Cryogenic control architecture for large-scale quantum computing

JM Hornibrook, JI Colless, ID Conway Lamb… - Physical Review …, 2015 - APS
Solid-state qubits have recently advanced to the level that enables them, in principle, to be
scaled up into fault-tolerant quantum computers. As these physical qubits continue to …

Fabrication and performance of GaN electronic devices

SJ Pearton, F Ren, AP Zhang, KP Lee - Materials Science and Engineering …, 2000 - Elsevier
GaN and related materials (especially AlGaN) have recently attracted a lot of interest for
applications in high power electronics capable of operation at elevated temperatures …

A survey of ohmic contacts to III-V compound semiconductors

AG Baca, F Ren, JC Zolper, RD Briggs, SJ Pearton - Thin solid films, 1997 - Elsevier
A survey of ohmic contact materials and properties to GaAs, InP, GaN will be presented
along with critical issues pertaining to each semiconductor material. Au-based alloys (eg …

[图书][B] The handbook of photonics

MC Gupta, J Ballato - 2018 - taylorfrancis.com
Reflecting changes in the field in the ten years since the publication of the first edition, The
Handbook of Photonics, Second Edition explores recent advances that have affected this …

Ion implantation doping in silicon carbide and gallium nitride electronic devices

F Roccaforte, F Giannazzo, G Greco - Micro, 2022 - mdpi.com
Wide band gap semiconductors such as silicon carbide (SiC) and gallium nitride (GaN) are
excellent materials for the next generation of high-power and high-frequency electronic …

Electrical, thermal, and microstructural characteristics of Ti/Al/Ti/Au multilayer Ohmic contacts to n-type GaN

A Motayed, R Bathe, MC Wood, OS Diouf… - Journal of applied …, 2003 - pubs.aip.org
GaN has been the topic of intense research and development activities during the past
years. These activities have demonstrated that GaN has great potential for both …

Ion implantation into gallium nitride

C Ronning, EP Carlson, RF Davis - Physics Reports, 2001 - Elsevier
This comprehensive review is concerned with studies regarding ion implanted gallium
nitride (GaN) and focuses on the improvements made in recent years. It is divided into three …

Low-resistance Ti/Al/Ti/Au multilayer ohmic contact to n-GaN

DF Wang, F Shiwei, C Lu, A Motayed, M Jah… - Journal of Applied …, 2001 - pubs.aip.org
A metallization scheme has been developed for obtaining low ohmic contacts to n-GaN with
a low contact resistance. The metal contact is a Ti/Al/Ti/Au composite with layers that are …