This article provides an overview of various patterning methodologies, and it is organized
into three major sections: generation of patterns, replication of patterns, and three …

In addition to its well-known capabilities in imaging and spectroscopy, scanning probe
microscopy (SPM) has recently shown great potentials for patterning of material structures in …

This review article aims to provide an updated and comprehensive description on the
development of atomic force microscopy (AFM) nanolithography for structuring and …

The size regime for devices produced by photolithographic techniques is limited. Therefore,
other patterning techniques have been intensively studied to create smaller structures …

Abstract In this Progress Report, outstanding scientific applications of scanning probe
microscopy (SPM) in the field of materials science and the latest technique developments …

Thin layer MoS 2-based field effect transistors (FET) are emerging candidates to fabricate
very fast and sensitive devices. Here, we demonstrate a method to fabricate very narrow …

The properties of 2D materials devices are very sensitive to the physical, chemical and
structural interactions that might happen during processing. Low-invasive patterning …

The surface oxidation of 2D transition metal dichalcogenides (TMDs) has recently gained
tremendous technological and fundamental interest owing to the multi‐functional properties …

In current scanning‐probe nanolithography research, substrates consisting of octadecyl
trichlorosilane monolayers on silicon are often used. On one hand, the presence of an …

The cover image depicts the direct writing of a germanium nanostructure with the tip of an
atomic force microscope (AFM). Germanium writing occurs when the AFM tip traces the …