Abstract Run-to-run (R2R) control is widely used in semiconductor manufacturing systems to
minimize the process drift, shift and variability. The R2R controller adjusts control actions or …

There is currently a lack of understanding of the deposition profile in a batch atomic layer
deposition (ALD) process. Also, no on-line control scheme has been proposed to resolve the …

Semiconductor vertical furnaces must achieve even faster and more precise temperature
control due to the demand for ever-reducing the minimum feature size or critical dimension …

This paper addresses the quality control of the photolithography process in the
semiconductor industry. Overlay errors in the process seriously affect the wafer yield, and …

This paper describes a multi-step Run-to-Run controller design for a class of furnace
deposition and CMP process flows. The wafer-to-wafer thickness variation introduced by the …

Semiconductor vertical furnaces are used in the semiconductor manufacturing process to
perform deposition and oxidation on wafers. To increase the equipment throughput, a …

This work focuses on the development of a computational fluid dynamic (CFD) model of a
batch atomic layer deposition (ALD) process and an associated run-to-run control scheme …

Furnace LPCVD processes have been used in Semiconductor Industry to enable high
aspect ratio film deposition and for high throughput through batching of multiple lots and …

Facilitated by the increasing importance and demand of semiconductors for the smart phone
and even the automobile industry, thermal atomic layer deposition (ALD) has gained …

In semiconductor industry, run-to-run (R2R) can strongly improve process performance by
adjusting process parameters. Based on R2R algorithm, Alternating Direction Method is …