Self-assembly of soft materials is broadly considered an attractive means of generating
nanoscale structures and patterns over large areas. However, the spontaneous formation of …

Block copolymers (BCPs) and their directed self‐assembly (DSA) has emerged as a
realizable complementary tool to aid optical patterning of device elements for future …

This comprehensive review, summarizes recent advances in the fabrication of well-ordered
block copolymer (BCP) thin films by different methods, focusing on the development of …

Resistive random access memory (ReRAM) is a promising candidate for future nonvolatile
memories. Resistive switching in a metal–insulator–metal structure is generally assumed to …

Continuous and scalable nanopatterning over flexible substrates is highly desirable for both
commercial and scientific interests, but is difficult to realize with traditional photolithographic …

The thin‐film directed self‐assembly of molecular building blocks into oriented nanostructure
arrays enables next‐generation lithography at the sub‐5 nm scale. Currently, the fabrication …

Recent advances in electronic and photonic devices, such as artificial skin, wearable
systems, organic and inorganic light-emitting diodes, have gained considerable commercial …

Exploring the ordering mechanism and dynamics of self‐assembled block copolymer (BCP)
thin films under confined conditions are highly essential in the application of BCP …

Next‐generation lithography techniques based on the self‐assembly of block copolymers
(BCPs) are promising methods for high‐resolution pattering. BCPs with a high …

A new approach to obtaining spherical nanodomains using polystyrene-block-
polydimethylsiloxane (PS-b-PDMS) is proposed. To reduce drastically the process time, we …