Selective area regrowth and doping for vertical gallium nitride power devices: Materials challenges and recent progress

H Fu, K Fu, C Yang, H Liu, KA Hatch, P Peri… - Materials Today, 2021 - Elsevier
This paper reviews materials challenges and recent progress for selective area regrowth
and doping for vertical gallium nitride (GaN) power devices. The purpose is to realize …

Investigation of vertical GaN-on-GaN p–n diode with regrown p-GaN for operation in Venus and other extreme environments

S Luo, K Fu, Q Xie, M Yuan, G Gao, H Guo… - Applied Physics …, 2023 - pubs.aip.org
This Letter reports the performance of vertical GaN-on-GaN p–n diodes with etch-then-
regrown p-GaN after exposure to a simulated Venus environment (460 C,∼ 94 bar …

[HTML][HTML] External charge compensation in etched gallium nitride measured by x-ray photoelectron spectroscopy

KA Hatch, DC Messina, H Fu, K Fu, Y Zhao… - Journal of Applied …, 2022 - pubs.aip.org
Electronic states at GaN surfaces and at regrowth and heteroepitaxy interfaces inhibit
electronic device performance. Understanding electronic state configuration at the GaN …

[HTML][HTML] Electronic structure of epitaxially grown and regrown GaN pn junctions characterized by scanning Kelvin probe and capacitance microscopy

TH Kim, K Fu, C Yang, Y Zhao, ET Yu - Journal of Applied Physics, 2022 - pubs.aip.org
Epitaxial regrowth of GaN pn junctions is a key technology for realization of a variety of high-
performance GaN power electronic devices. However, the regrowth process can introduce …

Impact of Substrate Morphology and Structural Defects in Freestanding Gallium Nitride on the Breakdown Characteristics of GaN-on-GaN Vertical Diodes

P Peri, K Fu, H Fu, J Zhou, Y Zhao, DJ Smith - Journal of Electronic …, 2023 - Springer
The morphology of GaN substrates grown by hydride vapor-phase epitaxy (HVPE) and by
ammonothermal methods has been correlated with reverse-bias stress testing applied to …