Block copolymers self-assemble on nanometer length scales, making them ideal for
emerging nanotechnologies. Many applications (eg, templating, membranes) require the …

The ability to pattern functional polymers at different length scales is important for research
fields including cell biology, tissue engineering and medicinal science and the development …

Block Copolymer Nanolithography: Translation of Molecular Level Control to Nanoscale Patterns
Page 1 Block Copolymer Nanolithography: Translation of Molecular Level Control to Nanoscale …

The self-assembly of block copolymers (BCPs) in the presence of crystallization as the
second driving force is reviewed, for BCPs in the bulk, thin films, single crystals and micelles …

The manufacture of smaller, faster, more efficient microelectronic components is a major
scientific and technological challenge, driven in part by a constant need for smaller …

Block copolymers have garnered significant attention in the past few decades due to their
ability to self-assemble into nanoscale structures (∼ 10–100 nm), making them ideal for …

Solvent vapor annealing of block copolymer thin films can produce a range of morphologies
different from the equilibrium bulk morphology. By systematically varying the flow rate of two …

Well-controlled monolayer patterns of microdomains of block copolymers (BCPs) have been
widely pursued for applications in sub-30-nm nanolithography.[1–11] BCP film processing is …

Ultrafiltration membranes based on cylinder-forming block copolymers are made by
orienting the cylinders perpendicular to the membrane surface followed by selective etching …

Block copolymer lithography holds promise as a next-generation technique to achieve the
sub-20 nm feature sizes demanded by semiconductor roadmaps. While molecular weight …