In plasma-based deposition processing, the importance of low-energy ion bombardment
during thin film growth can hardly be exaggerated. Ion bombardment is an important …

High power impulse magnetron sputtering (HiPIMS) has been at the center of attention over
the last years as it is an emerging physical vapor deposition (PVD) technology that …

The high power impulse magnetron sputtering (HiPIMS) discharge is a recent addition to
plasma based sputtering technology. In HiPIMS, high power is applied to the magnetron …

[57] ABSTRACT A high conductivity interconnect structure is formed by electroplating or
electroless plating of Cu or a Cu-base alloy on a seed layer comprising an alloy of a …

Efficient deposition of high-quality coatings often requires controlled application of excited or
ionized particles. These particles are either condensing (film-forming) or assisting by …

The physical and chemical aspects of plasma–surface interaction in high-power impulse
magnetron sputtering (HiPIMS) discharges are overviewed. The data obtained by various …

A new reactive ionization region model (R-IRM) is developed to describe the reactive Ar/O 2
high power impulse magnetron sputtering (HiPIMS) discharge with a titanium target. It is …

Plasma-based physical vapor deposition (PVD) methods have found widespread use in
various industrial applications. In plasma-based PVD processes, the deposition species are …

Pulsed plasmas use much higher power during each pulse compared to continuously
operated plasmas. This feature and the appearance of additional new variables such as …

Interconnects, once the technological backwater of integrated circuit technology, now
dominate integrated circuit cost and performance. As much as 90 percent of the signal delay …