In this paper, a Janus metastructure (JMS) is proposed that can act both as a logic gate and
detect multiple physical quantities. By adjusting the incident angle of electromagnetic waves …

The microwave cutoff probe (CP) is an accurate diagnostic technique to measure absolute
electron density even in processing gas plasmas. Because this technique needs the …

Recently, fluorocarbon (FC) film deposition on a SiO 2 surface has become one of the most
important processes in semiconductor manufacturing because the formation of a passivation …

The cutoff probe (CP) is a precise diagnostic technique that measures electron density using
two cylindrical probe tips and holders inserted in a low-pressure plasma. However, a recent …

Since a plasma processing control based on plasma diagnostics attracted considerable
attention in industry, the reproducibility of the diagnostics using in this application has …

In this study, plasma density measurements were performed near the plume region of the
remote plasma source (RPS) in Ar/${{\rm {NF}}} _ {3} $ gas mixtures using a microwave …

In this study, the influence of ceramic shield characteristics, including thickness and
geometry, on the transmission spectrum and electron density measurements of a ceramic …

This study developed Plasma Information-based Virtual Metrology (PI-VM) to predict etching
process results and analyze process phenomena. Using a dual-frequency capacitively …

Direct wafer bonding is one of the most attractive techniques for next-generation
semiconductor devices, and plasma has been playing an indispensable role in the wider …

We present a comparative study of electron density obtained in a low-temperature plasma
by the cutoff probe and compare the results with data from both the hairpin and the Langmuir …