Atomic layer deposition (ALD) is gaining attention as a thin film deposition method, uniquely
suitable for depositing uniform and conformal films on complex three-dimensional …

Promising designs and experimental realizations of devices with unusual properties in the
field of plasmonics have attracted a great deal of attention over the past few decades …

Atomic layer deposition is widely acknowledged as a powerful technique for the deposition
of high quality layers for several applications including photovoltaics (PV). The capability of …

Titanium nitride is considered a promising alternative plasmonic material and is known to
exhibit localized surface plasmon resonances within the near-infrared biological …

Petroleum-based synthetic plastics play an important role in our life. As the detrimental
health and environmental effects of synthetic plastics continue to increase, the renewable …

Thin films of colloidal semiconductor nanocrystals (NCs) are inherently metatstable
materials prone to oxidative and photothermal degradation driven by their large surface-to …

Polymer–inorganic core–shell nanofibers were produced by two-step approach;
electrospinning and atomic layer deposition (ALD). First, nylon 6, 6 (polymeric core) …

Following the graphene isolation, strong interest in two dimensional (2D) materials has been
driven by their outstanding properties. Their typical intrinsic structure, including strong in …

Optical properties of colloidal plasmonic titanium nitride nanoparticles are examined with an
eye on their photothermal and photocatalytic applications via transmission electron …

Low-temperature epitaxial growth of AlN ultrathin films was realized by atomic layer
deposition (ALD) together with the layer-by-layer, in-situ atomic layer annealing (ALA) …