Microscopic Mechanisms of Reaction-Coupled Acid Diffusion in Chemically Amplified Photoresists

Z Wang, H Du, H Xin, J Xue, J Zhang… - Chemistry of Materials, 2024 - ACS Publications
Diffusion in photoresists is a fundamental process that significantly impacts micro-nano
manufacturing. However, it often intertwines with chemical reactions, leading to intricate …

Accelerated diffusion following deprotection in chemically amplified resists

CM Bottoms, GE Stein… - The Journal of Physical …, 2022 - ACS Publications
Polymeric chemically amplified resists (CARs) are critical materials for high-throughput
lithographic processes. A photoactivated acid-anion catalyst changes the polymer's …

Tailoring the Wettability and Substrate Adherence of Thin Polymer Films with Surface-Segregating Bottlebrush Copolymer Additives

TS Laws, H Mei, T Terlier, R Verduzco, GE Stein - Langmuir, 2023 - ACS Publications
We developed “reactive” bottlebrush polymers based on styrene (S) and t-butyl acrylate
(tBA) as additives for polystyrene (PS) coatings. The bottlebrush polymers spontaneously …

Ion diffusion in chemically amplified resists

CM Bottoms, T Terlier, GE Stein, M Doxastakis - Macromolecules, 2021 - ACS Publications
The acid-catalyzed deprotection of glassy polymer resins is an important process in
semiconductor lithography. Studies have shown that the reaction kinetics in these materials …

Laser-induced sub-millisecond heating reveals distinct tertiary ester cleavage reaction pathways in a photolithographic resist polymer

B Jung, P Satish, DN Bunck, WR Dichtel, CK Ober… - ACS …, 2014 - ACS Publications
Acid-catalyzed, thermally activated ester cleavage reactions are critical for lithographic
patterning processes used in the semiconductor industry. The rates of these high …

Characterizing acid diffusion lengths in chemically amplified resists from measurements of deprotection kinetics

AA Patil, YN Pandey, M Doxastakis… - Journal of Micro …, 2014 - spiedigitallibrary.org
The acid-catalyzed deprotection of glassy poly (4-hydroxystyrene-co-tert butyl acrylate) films
was studied with infrared absorbance spectroscopy and stochastic simulations …

Enhanced catalyst mobility in chemically amplified resists

CM Bottoms, T Terlier, GE Stein… - … in Patterning Materials …, 2022 - spiedigitallibrary.org
In chemically amplified resists (CARs), it is known that catalyst diffusion is accelerated by the
deprotection reaction. However, the mechanisms that drive this enhancement are not yet …

Switching the solubility of polymers using intermolecular reactions and diffusion of small molecules

J Sitterly, J Nhan, M Niluxsshun, B Sangwan… - Journal of …, 2023 - jstage.jst.go.jp
A two-layer polymeric stack is designed to be converted to a three-layer stack via the
diffusion of small molecules between layers. The three-layer stack is composed of a bottom …

Probing ion diffusion in chemically amplified resists through experiments and atomistic simulations

CM Bottoms, T Terlier, GE Stein… - … in Patterning Materials …, 2021 - spiedigitallibrary.org
Catalyst diffusion is a critical component of the pattern formation process in chemically
amplified resists (CARs). In this study, we used a concerted experimental and modeling …

Modeling acid transport in chemically amplified resist films

AA Patil, M Doxastakis, GE Stein - Advances in Patterning …, 2014 - spiedigitallibrary.org
The acid-catalyzed deprotection of glassy poly (4-hydroxystyrene-co-tertbutyl acrylate) films
was studied with infrared absorbance spectroscopy and stochastic simulations …