Microscopic Mechanisms of Reaction-Coupled Acid Diffusion in Chemically Amplified Photoresists
Z Wang, H Du, H Xin, J Xue, J Zhang… - Chemistry of Materials, 2024 - ACS Publications
Diffusion in photoresists is a fundamental process that significantly impacts micro-nano
manufacturing. However, it often intertwines with chemical reactions, leading to intricate …
manufacturing. However, it often intertwines with chemical reactions, leading to intricate …
Accelerated diffusion following deprotection in chemically amplified resists
CM Bottoms, GE Stein… - The Journal of Physical …, 2022 - ACS Publications
Polymeric chemically amplified resists (CARs) are critical materials for high-throughput
lithographic processes. A photoactivated acid-anion catalyst changes the polymer's …
lithographic processes. A photoactivated acid-anion catalyst changes the polymer's …
Tailoring the Wettability and Substrate Adherence of Thin Polymer Films with Surface-Segregating Bottlebrush Copolymer Additives
We developed “reactive” bottlebrush polymers based on styrene (S) and t-butyl acrylate
(tBA) as additives for polystyrene (PS) coatings. The bottlebrush polymers spontaneously …
(tBA) as additives for polystyrene (PS) coatings. The bottlebrush polymers spontaneously …
Ion diffusion in chemically amplified resists
The acid-catalyzed deprotection of glassy polymer resins is an important process in
semiconductor lithography. Studies have shown that the reaction kinetics in these materials …
semiconductor lithography. Studies have shown that the reaction kinetics in these materials …
Laser-induced sub-millisecond heating reveals distinct tertiary ester cleavage reaction pathways in a photolithographic resist polymer
Acid-catalyzed, thermally activated ester cleavage reactions are critical for lithographic
patterning processes used in the semiconductor industry. The rates of these high …
patterning processes used in the semiconductor industry. The rates of these high …
Characterizing acid diffusion lengths in chemically amplified resists from measurements of deprotection kinetics
The acid-catalyzed deprotection of glassy poly (4-hydroxystyrene-co-tert butyl acrylate) films
was studied with infrared absorbance spectroscopy and stochastic simulations …
was studied with infrared absorbance spectroscopy and stochastic simulations …
Enhanced catalyst mobility in chemically amplified resists
In chemically amplified resists (CARs), it is known that catalyst diffusion is accelerated by the
deprotection reaction. However, the mechanisms that drive this enhancement are not yet …
deprotection reaction. However, the mechanisms that drive this enhancement are not yet …
Switching the solubility of polymers using intermolecular reactions and diffusion of small molecules
J Sitterly, J Nhan, M Niluxsshun, B Sangwan… - Journal of …, 2023 - jstage.jst.go.jp
A two-layer polymeric stack is designed to be converted to a three-layer stack via the
diffusion of small molecules between layers. The three-layer stack is composed of a bottom …
diffusion of small molecules between layers. The three-layer stack is composed of a bottom …
Probing ion diffusion in chemically amplified resists through experiments and atomistic simulations
Catalyst diffusion is a critical component of the pattern formation process in chemically
amplified resists (CARs). In this study, we used a concerted experimental and modeling …
amplified resists (CARs). In this study, we used a concerted experimental and modeling …
Modeling acid transport in chemically amplified resist films
The acid-catalyzed deprotection of glassy poly (4-hydroxystyrene-co-tertbutyl acrylate) films
was studied with infrared absorbance spectroscopy and stochastic simulations …
was studied with infrared absorbance spectroscopy and stochastic simulations …