Electron-induced fragmentation mechanisms in organic monomers and their implications for photoresist optimization for EUV lithography
Secondary electrons generated during the Extreme Ultraviolet Lithography (EUVL) process
are predominantly responsible for inducing important patterning chemistry in photoresist …
are predominantly responsible for inducing important patterning chemistry in photoresist …
[PDF][PDF] New material chemistry exploration for Extreme Ultraviolet Lithography
A Rathore - 2020 - lirias.kuleuven.be
Electronic devices are an integral part of modern society, enabling and supporting most of
the day-to-day tasks. In the past few decades, the power of these devices has increased …
the day-to-day tasks. In the past few decades, the power of these devices has increased …