A review of NBTI mechanisms and models

S Mahapatra, N Parihar - Microelectronics Reliability, 2018 - Elsevier
A comprehensive review is done of different NBTI mechanisms and models proposed in the
literature over the past years. The Reaction-Diffusion (RD) model based comprehensive …

A comparative study of different physics-based NBTI models

S Mahapatra, N Goel, S Desai, S Gupta… - IEEE transactions on …, 2013 - ieeexplore.ieee.org
Different physics-based negative bias temperature instability (NBTI) models as proposed in
the literature are reviewed, and the predictive capability of these models is benchmarked …

BTI analysis tool—Modeling of NBTI DC, AC stress and recovery time kinetics, nitrogen impact, and EOL estimation

N Parihar, N Goel, S Mukhopadhyay… - IEEE Transactions on …, 2017 - ieeexplore.ieee.org
A comprehensive modeling framework is presented to predict the time kinetics of negative
bias temperature instability stress and recovery during and after dc and ac stresses and also …

A critical re-evaluation of the usefulness of RD framework in predicting NBTI stress and recovery

S Mahapatra, AE Islam, S Deora… - 2011 International …, 2011 - ieeexplore.ieee.org
Reaction-Diffusion (RD) framework for interface trap generation along with hole trapping in
pre-existing and generated bulk oxide traps are used to model Negative Bias Temperature …

Modeling of NBTI using BAT framework: DC-AC stress-recovery kinetics, material, and process dependence

S Mahapatra, N Parihar - IEEE Transactions on Device and …, 2020 - ieeexplore.ieee.org
Threshold voltage shift (ΔVT) due to Negative Bias Temperature Instability (NBTI) in p-
MOSFETs is modeled using the BTI Analysis Tool (BAT) framework. The ΔV T time kinetics …

Understand NBTI mechanism by developing novel measurement techniques

MF Li, D Huang, C Shen, T Yang… - IEEE Transactions on …, 2008 - ieeexplore.ieee.org
Our recent investigations and understanding of the negative bias temperature instability
(NBTI) degradation in p-MOSFETs with ultrathin SiON gate dielectric are reviewed. The …

Reassessing the mechanisms of negative-bias temperature instability by repetitive stress/relaxation experiments

DS Ang, ZQ Teo, TJJ Ho, CM Ng - IEEE Transactions on Device …, 2010 - ieeexplore.ieee.org
A major intrinsic limitation of the reaction-diffusion (RD) model for negative-bias temperature
instability (NBTI) is revealed through dynamic stress experiments. We found no evidence of …

Odyssey of the charge pumping technique and its applications from micrometric-to atomic-scale era

B Djezzar - Journal of Applied Physics, 2023 - pubs.aip.org
This paper reviews the evolution of the charge pumping (CP) technique and its applications
from the micrometer-scale to the atomic-scale device era. We describe the more significant …

A comprehensive modeling framework for gate stack process dependence of DC and AC NBTI in SiON and HKMG p-MOSFETs

N Goel, K Joshi, S Mukhopadhyay, N Nanaware… - Microelectronics …, 2014 - Elsevier
A comprehensive modeling framework involving mutually uncorrelated contribution from
interface trap generation and hole trapping in pre-existing, process related gate insulator …

Characterization methods for BTI degradation and associated gate insulator defects

S Mahapatra, N Goel, A Chaudhary, K Joshi… - Fundamentals of Bias …, 2016 - Springer
In this chapter, different characterization methods are discussed to determine BTI
degradation of MOSFET parameters and to directly estimate the pre-existing and generated …