Atomic layer deposition (ALD) is gaining attention as a thin film deposition method, uniquely
suitable for depositing uniform and conformal films on complex three-dimensional …

Within its rich phase diagram titanium dioxide is a truly multifunctional material with a
property palette that has been shown to span from dielectric to transparent-conducting …

TiO 2 films were deposited by ALD on Si and glass substrates. FTIR analysis reveals an
incomplete process for deposition temperatures below 160° C. The transition from the …

The importance of surface roughness with respect to the bulk properties of dielectric
materials is often overlooked. Surface roughness or interfaces between different material …

Rapid progress achieved on perovskite solar cells raises the expectation for their further
development toward practical applications. Moisture sensitivity of perovskite materials is one …

This work demonstrates that ions have a strong impact on the growth per cycle (GPC) and
material properties during plasma-assisted atomic layer deposition (ALD) of TiO2 (titanium …

We studied the growth of TiO2 by liquid injection atomic layer deposition (ALD) utilizing two
different amide-based titanium sources, tetrakis-dimethylamido-titanium [(NMe2) 4-Ti …

A new time-of-flight elastic recoil detection spectrometer has been built, and initially the main
effort was focused in getting good timing resolution and high detection efficiency for light …

Atomic layer deposition (ALD) of metal sulfides has aroused tremendous interest recently for
its promising applications in many varieties of areas. However, most of the metal sulfide ALD …

A critical parameter for the implementation of standard high-efficiency photovoltaic absorber
materials for photoelectrochemical water splitting is its proper protection from chemical …