Metal‐assisted chemical etching of silicon in oxidizing HF solutions: origin, mechanism, development, and black silicon solar cell application

C Huo, J Wang, H Fu, X Li, Y Yang… - Advanced Functional …, 2020 - Wiley Online Library
Metal‐assisted chemical etching (MacEtch) of silicon in oxidizing hydrofluoric acid (HF)
solutions has emerged as a prominent top‐down micro/nanofabrication approach for a wide …

Voltage‐and Metal‐assisted Chemical Etching of Micro and Nano Structures in Silicon: A Comprehensive Review

S Surdo, G Barillaro - Small, 2024 - Wiley Online Library
Sculpting silicon at the micro and nano scales has been game‐changing to mold bulk silicon
properties and expand, in turn, applications of silicon beyond electronics, namely, in …

Large-scale synthesis of highly uniform silicon nanowire arrays using metal-assisted chemical etching

FJ Wendisch, M Rey, N Vogel… - Chemistry of Materials, 2020 - ACS Publications
The combination of metal-assisted chemical etching (MACE) with colloidal lithography has
emerged as a simple and cost-effective approach to nanostructure silicon. It is especially …

Achieving a sub-10 nm nanopore array in silicon by metal-assisted chemical etching and machine learning

Y Chen, Y Chen, J Long, D Shi, X Chen… - … Journal of Extreme …, 2021 - iopscience.iop.org
Solid-state nanopores with controllable pore size and morphology have huge application
potential. However, it has been very challenging to process sub-10 nm silicon nanopore …

Producing silicon carbide micro and nanostructures by plasma‐free metal‐assisted chemical etching

JA Michaels, L Janavicius, X Wu… - Advanced Functional …, 2021 - Wiley Online Library
Silicon carbide (SiC) is a wide bandgap third‐generation semiconductor well suited for
harsh environment power electronics, micro and nano electromechanical systems, and …

Enhanced Performance of Ge Photodiodes via Monolithic Antireflection Texturing and α-Ge Self-Passivation by Inverse Metal-Assisted Chemical Etching

M Kim, S Yi, JD Kim, X Yin, J Li, J Bong, D Liu, SC Liu… - ACS …, 2018 - ACS Publications
Surface antireflection micro and nanostructures, normally formed by conventional reactive
ion etching, offer advantages in photovoltaic and optoelectronic applications, including …

Ruthenium-assisted chemical etching of silicon: Enabling CMOS-compatible 3D semiconductor device nanofabrication

A Mallavarapu, P Ajay, C Barrera… - ACS Applied Materials …, 2020 - ACS Publications
The semiconductor industry's transition to three-dimensional (3D) logic and memory devices
has revealed the limitations of plasma etching in reliable creation of vertical high aspect ratio …

CMOS-Compatible Catalyst for MacEtch: Titanium nitride-assisted chemical etching in vapor phase for high Aspect ratio Silicon nanostructures

JD Kim, M Kim, C Chan, N Draeger… - … applied materials & …, 2019 - ACS Publications
Metal-assisted chemical etching (MacEtch) is an emerging anisotropic chemical etching
technique that has been used to fabricate high aspect ratio semiconductor micro-and …

Damage-free smooth-sidewall InGaAs nanopillar array by metal-assisted chemical etching

L Kong, Y Song, JD Kim, L Yu, D Wasserman… - ACS …, 2017 - ACS Publications
Producing densely packed high aspect ratio In0. 53Ga0. 47As nanostructures without
surface damage is critical for beyond Si-CMOS nanoelectronic and optoelectronic devices …

Microfabrication of X-ray optics by metal assisted chemical etching: A review

L Romano, M Stampanoni - Micromachines, 2020 - mdpi.com
High-aspect-ratio silicon micro-and nanostructures are technologically relevant in several
applications, such as microelectronics, microelectromechanical systems, sensors …