Recent advances in the plasma-assisted synthesis of silicon-based thin films and nanostructures
P Mandracci, P Rivolo - Coatings, 2023 - mdpi.com
Silicon-based thin films and nanostructures are of paramount importance in a wide range of
applications, including microelectronics, photovoltaics, large area sensors, and biomedicine …
applications, including microelectronics, photovoltaics, large area sensors, and biomedicine …
Maskless patterned plasma fabrication of interdigitated back contact silicon heterojunction solar cells: Characterization and optimization
We demonstrate a novel method to fabricate passivated interdigitated back contact (IBC)
crystalline silicon solar cells incorporating a maskless, patterned plasma etching step. After …
crystalline silicon solar cells incorporating a maskless, patterned plasma etching step. After …
[HTML][HTML] Homoepitaxial growth of device-grade GaAs using low-pressure remote plasma CVD
L Watrin, F Silva, L Largeau, N Findling… - Materials Science in …, 2025 - Elsevier
We have achieved the growth of high-quality, homoepitaxial 100 GaAs thin films at 0.5 mbar
and 500° C using a Remote Plasma Chemical Vapor Deposition (RP-CVD) reactor. With this …
and 500° C using a Remote Plasma Chemical Vapor Deposition (RP-CVD) reactor. With this …
Direct growth of highly oriented GaN thin films on silicon by remote plasma CVD
We report on low-temperature (500 C) and low-pressure (0.3 mbar) direct growth of GaN thin
films on silicon (100) substrates using remote plasma chemical vapour deposition (RP …
films on silicon (100) substrates using remote plasma chemical vapour deposition (RP …
[PDF][PDF] Profile Control of Patterned Plasma Deposition and Etching
The use of a patterned electrode in a plasma-enhanced chemical vapour deposition system
allows one to perform deposition or etching in a pattern without resorting to masking or …
allows one to perform deposition or etching in a pattern without resorting to masking or …