Ar+ sputter etching is often used prior to X-ray photoelectron spectroscopy (XPS) analyses
with the intention to remove surface oxides and contaminants. Since the XPS probing depth …

The electron configuration in single crystalline (sc-) titanium nitride (TiN) has been
quantitatively studied using angle resolved X-ray photoelectron spectroscopy (AR-XPS). All …

We present the first measurements of x-ray photoelectron spectroscopy (XPS) core level
binding energies (BE: s) for the widely-applicable group IVb-VIb polycrystalline transition …

Findings concerning the electronic and structural properties of clean surfaces of transition-
metal carbides and nitrides are reviewed. Topics treated are: investigations of the occupied …

Hard, refractory thin films consisting of group IVB element mono-nitrides deposited using
various chemical and physical vapour-deposition techniques are widely used in wear …

Thin films of zirconium nitride were deposited on different substrates by direct current
reactive magnetron sputtering, varying the deposition time, Ar/N2 partial pressure ratio and …

An experimental study of the electronic structure of Ti1− xMoxNy thin films deposited by
reactive sputtering is presented. We analyze the degree of nitridation of TiNy, MoNy and …

The atomic structure, stability and electronic properties of zirconium and hafnium nitrides
and oxynitrides (⁠ MN⁠, M 3 N 4⁠, and M 2 N 2 O⁠; M= Zr⁠, Hf) have been studied using …

Zr–N thin films were deposited on Si (100) substrate by reactive sputtering using a pulsed
DC magnetron sputtering technique. It was found that films deposited at 773K and 1sccm of …

Partially oxidized zirconium, niobium, and tantalum carbonitrides were prepared to discuss a
characteristic common to all. The onset potential for the ORR of partially oxidized …