Central to future electronic device developments in diamond is the provision of smooth, low
defect density substrate materials. This review examines plasma treatments of diamond to …

Diamond is a promising material for the modern industry. It is widely used in different
applications, such as cutting tools, optical windows, heat dissipation, and semiconductors …

Chemical vapor deposited (CVD) diamond as a burgeoning multifunctional material with
tailored quality and characteristics can be artificially synthesized and controlled for various …

Diamond offers a unique combination of extreme physical properties. For many
technological applications, diamond samples of the highest crystal quality are required to …

In this paper, vertical diamond Schottky barrier diode with a beveled junction termination
extension is designed by using Silvaco TCAD. We firstly investigate the effects of the pn …

H2/O2 plasma treatments offer advantages over other etching processes of diamond as a
technique to prepare the substrate surface prior to chemical vapor deposition (CVD) …

The development of dislocation density and micro-strain in heteroepitaxial diamond films on
iridium was measured over more than two decades of thickness up to d≈ 1 mm. Simple …

Surface etching of single-crystal diamond (SCD) in hydrogen plasma plays a decisive role
for high-quality homoepitaxy and surface conduction of diamond. The complexity of …

Characterizing crystallographic orientation is essential for assessing structure-property
relationships in crystalline solids. While diffraction methods have dominated this field, low …

High purity chemically vapor deposited (CVD) diamond single crystals are now widely
available. However, the reduction of dislocations in this material still remains an important …