Atomic layer deposition (ALD) is gaining attention as a thin film deposition method, uniquely
suitable for depositing uniform and conformal films on complex three-dimensional …

Nanoparticles (NPs) are applied in a wide range of processes, and their use continues to
increase. Fluidization is one of the best techniques available to disperse and process NPs …

Recently, a new approach to atomic layer deposition (ALD) has been developed that doesn't
require vacuum and is much faster than conventional ALD. This is achieved by separating …

This report is the first effort to use atomic layer deposition method for deposition of
nanosized-thin and highly conformal Al2O3 coatings onto LiMn2O4 cathodes with precise …

Tight ceramic nanofiltration (NF) membranes allow efficient separation of organic matter and
ions for advanced water treatment. These membranes are typically produced by the sol-gel …

Atomic layer deposition (ALD) has found versatile applications in energy, environmental,
and anthropogenic systems. The self‐terminating surface chemistry characteristic of ALD …

The number of possible applications for nanoparticles has strongly increased in the last
decade. For many applications, nanoparticles with different surface and bulk properties are …

To enhance the cycling stability of LiMn2O4 especially at elevated temperature, we use the
atomic layer deposition (ALD) method to deposit ultrathin and highly conformal ZnO coatings …

Atomic layer deposition (ALD) is an excellent technique to make nanostructured particles:
particles of which the surface is either covered by an ultrathin film or by nanoclusters, with …

A fundamental understanding of the interplay between ligand‐removal kinetics and metal
aggregation during the formation of platinum nanoparticles (NPs) in atomic layer deposition …