[HTML][HTML] Atomic layer deposition and other thin film deposition techniques: from principles to film properties

JA Oke, TC Jen - Journal of Materials Research and Technology, 2022 - Elsevier
Thin film is a modern technology aimed at improving the structural, electrical, magnetic,
optical, and mechanical properties of bulk materials. This technology has so far found …

Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends

V Miikkulainen, M Leskelä, M Ritala… - Journal of Applied …, 2013 - pubs.aip.org
Atomic layer deposition (ALD) is gaining attention as a thin film deposition method, uniquely
suitable for depositing uniform and conformal films on complex three-dimensional …

Atomic layer deposition of metal sulfide materials

NP Dasgupta, X Meng, JW Elam… - Accounts of chemical …, 2015 - ACS Publications
Conspectus The field of nanoscience is delivering increasingly intricate yet elegant
geometric structures incorporating an ever-expanding palette of materials. Atomic layer …

Advances in atomic layer deposition of metal sulfides: from a precursors perspective

SJA Zaidi, MA Basit, TJ Park - Chemistry of Materials, 2022 - ACS Publications
Development at the nanoscale has established diverse and complex structures with the help
of a growing selection of materials to choose from. Among the major developments that has …

Nanoengineering and interfacial engineering of photovoltaics by atomic layer deposition

JR Bakke, KL Pickrahn, TP Brennan, SF Bent - Nanoscale, 2011 - pubs.rsc.org
Investment into photovoltaic (PV) research has accelerated over the past decade as
concerns over energy security and carbon emissions have increased. The types of PV …

Targeted single-site MOF node modification: trivalent metal loading via atomic layer deposition

IS Kim, J Borycz, AE Platero-Prats… - Chemistry of …, 2015 - ACS Publications
Postsynthetic functionalization of metal organic frameworks (MOFs) enables the controlled,
high-density incorporation of new atoms on a crystallographically precise framework …

Aqueous bath process for deposition of Cu2ZnSnS4 photovoltaic absorbers

A Wangperawong, JS King, SM Herron, BP Tran… - Thin Solid Films, 2011 - Elsevier
Chemical bath deposition and ion exchange were used to incorporate copper, zinc, tin and
sulfur into a thin film precursor stack. The stack was then sulfurized to form the photovoltaic …

Thermal atomic layer etching of zinc sulfide using sequential trimethylaluminum and hydrogen fluoride exposures: Evidence for a conversion mechanism

T Nam, JL Partridge, SM George - Chemistry of Materials, 2023 - ACS Publications
Thermal atomic layer etching (ALE) of zinc sulfide (ZnS) was demonstrated using sequential
exposures of Al (CH3) 3 (trimethylaluminum (TMA)) and HF (hydrogen fluoride). ZnS is one …

Self-assembly based plasmonic arrays tuned by atomic layer deposition for extreme visible light absorption

C Hägglund, G Zeltzer, R Ruiz, I Thomann… - Nano …, 2013 - ACS Publications
Achieving complete absorption of visible light with a minimal amount of material is highly
desirable for many applications, including solar energy conversion to fuel and electricity …

Atomic layer deposition: an enabling technology for the growth of functional nanoscale semiconductors

N Biyikli, A Haider - Semiconductor Science and Technology, 2017 - iopscience.iop.org
In this paper, we present the progress in the growth of nanoscale semiconductors grown via
atomic layer deposition (ALD). After the adoption by semiconductor chip industry, ALD …