Zero defect manufacturing: state-of-the-art review, shortcomings and future directions in research

F Psarommatis, G May, PA Dreyfus… - International journal of …, 2020 - Taylor & Francis
This paper provides a literature review on zero defect manufacturing based on the content
analysis performed for 280 research articles published from 1987 to 2018 in a variety of …

Virtual metrology as an approach for product quality estimation in Industry 4.0: a systematic review and integrative conceptual framework

PA Dreyfus, F Psarommatis, G May… - International Journal of …, 2022 - Taylor & Francis
Virtual metrology (VM) involves estimating a product's quality directly from production
process data without physically measuring it. This enables the product quality of each unit of …

A requirements driven digital twin framework: Specification and opportunities

J Moyne, Y Qamsane, EC Balta, I Kovalenko… - Ieee …, 2020 - ieeexplore.ieee.org
Among the tenets of Smart Manufacturing (SM) or Industry 4.0 (I4. 0), digital twin (DT), which
represents the capabilities of virtual representations of components and systems, has been …

Advances in large-scale metrology–review and future trends

RH Schmitt, M Peterek, E Morse, W Knapp, M Galetto… - CIRP Annals, 2016 - Elsevier
Abstract The field of Large-Scale Metrology has been studied extensively for many decades
and represents the combination and competition of topics as diverse as geodesy and …

A unified digital twin framework for real-time monitoring and evaluation of smart manufacturing systems

Y Qamsane, CY Chen, EC Balta… - 2019 IEEE 15th …, 2019 - ieeexplore.ieee.org
Digital Twin (DT) is one of the key enabling technologies for realizing the promise of Smart
Manufacturing (SM) and Industry 4.0 to improve production systems operation. Driven by the …

Adaptive virtual metrology for semiconductor chemical mechanical planarization process using GMDH-type polynomial neural networks

X Jia, Y Di, J Feng, Q Yang, H Dai, J Lee - Journal of Process Control, 2018 - Elsevier
Virtual metrology (VM) is drawing more and more attention in the recent research of wafer to
wafer control for semiconductor manufacturing. Although many different approaches for VM …

Virtual metrology and feedback control for semiconductor manufacturing processes using recursive partial least squares

AA Khan, JR Moyne, DM Tilbury - Journal of Process Control, 2008 - Elsevier
Virtual metrology (VM) is the prediction of metrology variables (either measurable or non-
measurable) using process state and product information. In the past few years VM has …

Virtual metrology in semiconductor manufacturing: Current status and future prospects

V Maitra, Y Su, J Shi - Expert Systems with Applications, 2024 - Elsevier
Abstract Advanced Process Control (APC) has become an increasingly pressing issue for
the semiconductor industry, particularly in the new era of sub-5nm process technology. To …

Adaptive virtual metrology design for semiconductor dry etching process through locally weighted partial least squares

T Hirai, M Kano - IEEE Transactions on Semiconductor …, 2015 - ieeexplore.ieee.org
In semiconductor manufacturing processes, virtual metrology (VM) has been investigated as
a promising tool to predict important characteristics of products. Although partial least …

Virtual metrology for run-to-run control in semiconductor manufacturing

P Kang, D Kim, H Lee, S Doh, S Cho - Expert Systems with Applications, 2011 - Elsevier
In semiconductor manufacturing processes, run-to-run (R2R) control is used to improve
productivity by adjusting process inputs run by run. A process will be controlled based on …