Measuring the magnetic configuration at complex buried layers and interfaces is an
important task, which requires especially a non-destructive probing technique. X-ray …

Atomic-layer-deposited alumina (ALD Al2O3) can be utilized for passivation, structural, and
functional purposes in electronics. In all cases, the deposited film is usually expected to …

Abstract Atomic Layer Deposition (ALD) of Al 2 O 3/TiO 2 nanolaminate was applied to
improve the sealing properties of CrN coating deposited with Physical Vapor Deposition …

Additive solution process patterning, such as inkjet printing, is desirable for high‐throughput
roll‐to‐roll and sheet fabrication environments of electronics manufacturing because it can …

An insulating ferromagnetic ground state is a fundamental prerequisite for the quantum
anomalous Hall (QAH) effect observed in magnetically doped topological insulators such as …

Plasma-enhanced atomic layer deposition was utilized to grow aluminum nitride (AlN) films
on Si from trimethylaluminum and N 2: H 2 plasma at 200 C. Thermal treatments were then …

The atomic layer deposition (ALD) of AlN from AlCl 3 was investigated using a thermal
process with NH 3 and a plasma-enhanced (PE) ALD process with Ar/NH 3 plasma. The …

X-ray resonant magnetic reflectivity (XRMR) is a powerful method to determine the optical,
structural and magnetic depth profiles of a variety of thin film systems. Here, we investigate …

We report the effect of plasma parameters on the properties of ultrathin Al 2 O 3 films
prepared by plasma enhanced atomic layer deposition for moisture barrier applications. The …

In this paper, we have optimized a low-temperature atomic layer deposition (ALD) of SiO2
using AP-LTO® 330 and ozone (O3) as precursors, and demonstrated its suitability to …