Development of hafnium based high-k materials—A review

JH Choi, Y Mao, JP Chang - Materials Science and Engineering: R: Reports, 2011 - Elsevier
The move to implement metal oxide based gate dielectrics in a metal-oxide-semiconductor
field effect transistor is considered one of the most dramatic advances in materials science …

Role of oxygen vacancies in ferroelectric or resistive switching hafnium oxide

J Lee, K Yang, JY Kwon, JE Kim, DI Han, DH Lee… - Nano …, 2023 - Springer
HfO2 shows promise for emerging ferroelectric and resistive switching (RS) memory devices
owing to its excellent electrical properties and compatibility with complementary metal oxide …

Metal oxide resistive memory switching mechanism based on conductive filament properties

G Bersuker, DC Gilmer, D Veksler, P Kirsch… - Journal of Applied …, 2011 - pubs.aip.org
By combining electrical, physical, and transport/atomistic modeling results, this study
identifies critical conductive filament (CF) features controlling TiN/HfO 2/TiN resistive …

High efficient degradation of dye molecules by PDMS embedded abundant single-layer tungsten disulfide and their antibacterial performance

S Masimukku, YC Hu, ZH Lin, SW Chan, TM Chou… - Nano Energy, 2018 - Elsevier
This work, we achieved the first-ever demonstration in the polydimethylsiloxane embedded
with the abundant single-layer tungsten disulfide (WS 2) nanoflowers (PDMS/WS 2 NFs) for …

[HTML][HTML] Multifunctional graphene/POSS epoxy resin tailored for aircraft lightning strike protection

M Raimondo, L Guadagno, V Speranza… - Composites Part B …, 2018 - Elsevier
This paper presents a first successful attempt to obtain a conductivity mapping at nanoscale
level of a new multifunctional fire retardant graphene/polyhedral oligomeric silsesquioxane …

The interaction of oxygen vacancies with grain boundaries in monoclinic HfO2

K McKenna, A Shluger - Applied Physics Letters, 2009 - pubs.aip.org
The diffusion and segregation of oxygen vacancies near a grain boundary in m-HfO 2 is
investigated by first principles calculations. We find that both neutral and positive vacancies …

Forming‐free grain boundary engineered hafnium oxide resistive random access memory devices

S Petzold, A Zintler, R Eilhardt, E Piros… - Advanced Electronic …, 2019 - Wiley Online Library
A model device based on an epitaxial stack combination of titanium nitride (111) and
monoclinic hafnia (11 1¯) is grown onto ac‐cut Al2O3‐substrate to target the role of grain …

Transparent High‐Performance Thin Film Transistors from Solution‐Processed SnO2/ZrO2 Gel‐like Precursors

J Jang, R Kitsomboonloha, SL Swisher… - Advanced …, 2013 - Wiley Online Library
Transparent electronics is expected to address a significant problem in virtually all flat panel
displays. In current display technologies, which emit light through a transparent glass …

Grain boundary mediated leakage current in polycrystalline HfO2 films

K McKenna, A Shluger, V Iglesias, M Porti… - Microelectronic …, 2011 - Elsevier
In this work, we combine conductive atomic force microscopy (CAFM) and first principles
calculations to investigate leakage current in thin polycrystalline HfO 2 films. A clear …

Grain boundary-driven leakage path formation in HfO2 dielectrics

G Bersuker, J Yum, L Vandelli, A Padovani… - Solid-State …, 2011 - Elsevier
The evolution over time of the leakage current in HfO2-based MIM capacitors under
continuous or periodic constant voltage stress (CVS) was studied for a range of stress …