Plasma asymmetry generation in capacitively coupled plasma (CCP) discharges provides
control over vital parameters that are useful in many plasma processing applications. In this …

The effects of the simultaneous presence of two different types of plasma asymmetry, viz,
geometric and electrical, on low-pressure capacitively coupled argon discharges are studied …

Low pressure single-or dual-frequency capacitively coupled radio frequency (RF) plasmas
are frequently used for high-aspect ratio (HAR) dielectric etching due to their capability to …

Tailored voltage waveform, composed of a fundamental frequency and the second
harmonic, is applied to a capacitively coupled chlorine discharge operated in the pressure …

We investigate the energy and angular distributions of ions reaching the electrodes in low-
pressure, capacitively coupled oxygen radio-frequency discharges. These distributions, as …

The electrical asymmetry effect (EAE) enables separate control of the ion flux and the mean
ion energy in capacitively coupled plasmas (CCP). While a variety of plasma processing …

Neutral radicals generated by electron impact dissociation of the background gas play
important roles in etching and deposition processes in low pressure capacitively coupled …

Low-pressure capacitively coupled radio frequency discharges operated in O 2 and driven
by tailored voltage waveforms are investigated experimentally and by means of kinetic …

Abstract The Electrical Asymmetry Effect (EAE) provides control of the mean ion energy at
the electrodes of multi-frequency capacitively coupled radio frequency plasmas (CCP) by …

Self-organized striated structure has been observed experimentally and numerically in CF 4
plasmas in radio-frequency capacitively coupled plasmas recently (Liu et al 2016 Phys. Rev …