Design and morphological investigation of high-χ catechol-containing styrenic block copolymers
We report the synthesis of multifunctional block copolymers (BCPs) showing a high Flory–
Huggins interaction parameter (χ), which enable sub-10 nm line-space structures for a low …
Huggins interaction parameter (χ), which enable sub-10 nm line-space structures for a low …
Isomeric effect enabled thermally driven self-assembly of hydroxystyrene-based block copolymers
C Kanimozhi, M Kim, SR Larson, JW Choi… - ACS Macro …, 2016 - ACS Publications
We demonstrate through isomeric effect the modulation of thermal properties of poly
(hydroxystyrene)(PHS)-based block copolymers (BCPs). A minimal structural change of …
(hydroxystyrene)(PHS)-based block copolymers (BCPs). A minimal structural change of …
Grapho-epitaxy DSA process with dimension control of template pattern
A method for defining a template for directed self-assembly (DSA) materials includes
patterning a resist on a stack including an ARC and a mask formed over a hydrophilic layer …
patterning a resist on a stack including an ARC and a mask formed over a hydrophilic layer …
Template for self assembly and method of making a self assembled pattern
J Kim, WAN Jinxiu, S Miyazaki, G Lin, H Wu - US Patent 10,457,088, 2019 - Google Patents
US10457088B2 - Template for self assembly and method of making a self assembled
pattern - Google Patents US10457088B2 - Template for self assembly and method of …
pattern - Google Patents US10457088B2 - Template for self assembly and method of …
Grapho-epitaxy DSA process with dimension control of template pattern
A method for defining a template for directed self-assembly (DSA) materials includes
patterning a resist on a stack including an ARC and a mask formed over a hydrophilic layer …
patterning a resist on a stack including an ARC and a mask formed over a hydrophilic layer …
Underlayer composition for promoting self assembly and method of making and using
H Wu, J Yin, G Lin, J Kim, J Shan - US Patent 9,093,263, 2015 - Google Patents
US9093263B2 - Underlayer composition for promoting self assembly and method of making and
using - Google Patents US9093263B2 - Underlayer composition for promoting self assembly and …
using - Google Patents US9093263B2 - Underlayer composition for promoting self assembly and …
Underlayer composition for promoting self assembly and method of making and using
Y Yi, J Yin, G Lin - US Patent 9,181,449, 2015 - Google Patents
Disclosed herein is an underlayer composition, wherein the underlayer is typically used for
promoting the formation of self assembled structures, and wherein the underlayer formu …
promoting the formation of self assembled structures, and wherein the underlayer formu …
Compositions of neutral layer for directed self assembly block copolymers and processes thereof
H Wu, Y Cao, SE Hong, J Yin, M Paunescu… - US Patent …, 2015 - Google Patents
The present invention relates to novel processes for using the neutral layer compositions for
aligning microdomains of directed self-assembling block copolymers (BCP). The processes …
aligning microdomains of directed self-assembling block copolymers (BCP). The processes …
Compositions and processes for self-assembly of block copolymers
H Wu, J Kim, J Shan, D Baskaran… - US Patent …, 2021 - Google Patents
The present invention relates to a novel styrenic polymer and to the novel composition
comprised of this polymer and a solvent; wherein the styrenic polymer has a polydispersity …
comprised of this polymer and a solvent; wherein the styrenic polymer has a polydispersity …
Polymer compositions for self-assembly applications
H Wu, J Yin, G Lin - US Patent 11,518,730, 2022 - Google Patents
The present invention relates to a composition comprises at least one random copolymer
having at least one repeat unit of structure (1), The present invention also relates to novel …
having at least one repeat unit of structure (1), The present invention also relates to novel …