Metal oxide resistive memory switching mechanism based on conductive filament properties

G Bersuker, DC Gilmer, D Veksler, P Kirsch… - Journal of Applied …, 2011 - pubs.aip.org
By combining electrical, physical, and transport/atomistic modeling results, this study
identifies critical conductive filament (CF) features controlling TiN/HfO 2/TiN resistive …

Filamentary and interface switching of CMOS-compatible Ta2O5 memristor for non-volatile memory and synaptic devices

JH Ryu, F Hussain, C Mahata, M Ismail, Y Abbas… - Applied Surface …, 2020 - Elsevier
To successively implement synaptic memristor device in the neuromorphic computing
system, it is essential to perform a variety of synaptic characteristics with low power …

Direct Observation of Dual-Filament Switching Behaviors in Ta2 O5-Based Memristors.

CF Chang, JY Chen, CW Huang, CH Chiu… - Small (Weinheim an …, 2017 - europepmc.org
The Forming phenomenon is observed via in situ transmission electron microscopy in the
Ag/Ta2 O5/Pt system. The device is switched to a low-resistance state as the dual filament is …

Introduction of interfacial load polymeric layer to organic flexible memristor for regulating conductive filament growth

HL Park, MH Kim, SH Lee - Advanced Electronic Materials, 2020 - Wiley Online Library
In flexible neuromorphic electronics, solution‐processed organic memristors are important
elements to perform memory functions. Despite considerable development for improving …

Compatible resistive switching mechanisms in Ni/SiOx/ITO and application to neuromorphic systems

M Park, J Park, S Kim - Journal of Alloys and Compounds, 2022 - Elsevier
In this work, we studied the switching mechanisms of Ni/SiO x/ITO devices before and after
experiencing a reversible switching. And we also investigated its application for …

Evidence of surface cleaning during electric field assisted sintering

CS Bonifacio, TB Holland, K van Benthem - Scripta Materialia, 2013 - Elsevier
The cleaning of nanoparticles from surface oxides or contaminants is critical during the initial
stages of spark plasma sintering (SPS). However, so far only indirect evidence has …

Factors determining the resistive switching behavior of transparent InGaZnO‐Based memristors

F Qin, Y Zhang, H Park, CS Kim, DH Lee… - physica status solidi …, 2022 - Wiley Online Library
The overarching goal herein is to identify the factors dominating the performance of a‐IGZO‐
based memristors. Despite the highest on/off ratio, greater than 104 with a preferred minimal …

Role and optimization of thermal rapid annealing in Ta/TaOx/Ru based resistive switching memory

J Zhao, Y Li, J Li, L Zhou - Vacuum, 2021 - Elsevier
The performance of resistive switching (RS) device based on sandwich structure is greatly
affected by the characteristics of the RS layer, electrode, and interface. In this work, the effect …

Performance and reliability trade-offs for high-κ RRAM

N Raghavan - Microelectronics Reliability, 2014 - Elsevier
Resistive random access memories (RRAM) have shown tremendous potential in replacing
Flash technology for future non-volatile data storage device applications in just about a …

Resistive Switching with Self-Rectifying Tunability and Influence of the Oxide Layer Thickness in Ni/HfO2/n+-Si RRAM Devices

A Rodriguez-Fernandez, S Aldana… - … on Electron Devices, 2017 - ieeexplore.ieee.org
The impact of the dielectric thickness, forming polarity, and current compliance on the self-
rectifying current-voltage (IV) characteristics of Ni/HfO 2/n+-Si resistive random access …