Modification of Schottky barrier height using an inorganic compound interface layer for various contact metals in the metal/p-Si device structure

Z Çaldıran - Journal of Alloys and Compounds, 2021 - Elsevier
In this study, lithium fluoride (LiF) was employed as an interface material by thermal
evaporation technique and its effect of on basic device parameters such as Schottky barrier …

Ocaya–Yakuphanoğlu method for series resistance extraction and compensation of Schottky diode I–V characteristics

RO Ocaya, F Yakuphanoğlu - Measurement, 2021 - Elsevier
We present a novel resistance-compensated I–V method to extract the series resistance,
ideality factor, barrier height and built-in potential of a metal–semiconductor diode. We show …

Perovskite/p-Si photodiode with ultra-thin metal cathode

OS Cifci, A Kocyigit, P Sun - Superlattices and Microstructures, 2018 - Elsevier
Perovskites have attracted great interest because they provide promising improvement for
solar cells. Yet, the perovskites have not been extensively used by the researchers for diode …

Exploring the Temperature-Dependent Microelectrical Characteristics of Organic-Silicon Heterojunctions in the Absence of Luminance

Akash, JP Tiwari - ACS Applied Energy Materials, 2024 - ACS Publications
An organic–silicon (O/S) interface represents a fundamental heterojunction in
semiconductor technology with significant implications for the advancement of electronic …

Fabrication of p-Si/n-NiO: Zn photodiodes and current/capacitance-voltage characterizations

SA Pehlivanoglu - Physica B: Condensed Matter, 2021 - Elsevier
The present study includes the results of a series of studies on the appropriateness of their
use as photodiodes after investigating some of the physical properties of Zn doped NiO films …

Fabrication and characterization of Au/n-type InP Schottky barrier diode with monolayer graphene interlayer

FEC Çatır - Semiconductor Science and Technology, 2020 - iopscience.iop.org
Abstract Au/graphene/n-InP Schottky barrier diode (SBD) was fabricated by the use of spray
pyrolysis technique with a monolayer graphene interlayer, and the temperature dependent …

The effect of indium doping concentration on the electrical and dielectric properties of Al/In: ZnO/p-Si heterojunctions

M Yıldırım, MO Erdal, A Kocyigit - Physica B: Condensed Matter, 2019 - Elsevier
Abstract Undoped and 0.1% 0.5% and 1.0% indium doped ZnO thin films were obtained by
spin coating method as interfacial thin film layer between Al metal and p-Si semiconductor to …

The Electrical Characteristics and the Interface State Densities of Al/p-Si Structures with and Without the GO Insulator Layer

Y Aslan, H Seymen, N Berk… - Current Chinese …, 2022 - ingentaconnect.com
Introduction: The current-voltage (IV) characteristics of the Al/p-type Si Metal-Semiconductor
(MS) and Al/GO/p-type Si Metal-Oxide-Semiconductor (MOS) structure were investigated at …

[HTML][HTML] Электрические и фотоэлектрические свойства фотоэлемента, основанного на двух контактах Л1-р-Б1 и Т1-р-Б1 с барьером Шоттки

АИ Блесман, РБ Бурлаков… - Омский научный …, 2019 - cyberleninka.ru
Задачей исследований является разработка структуры и способа изготовления
фотоэлемента, способного принимать излучение либо в ближней инфракрасной …

Superjunction MOSFET with a trench contact on partly relatively lightly doped P-pillar for excellent reverse recovery

R Li, M Huang, X Zhang, M Hu, Z Yang… - Semiconductor …, 2021 - iopscience.iop.org
A superjunction metal-oxide-semiconductor field-effect transistor (SJ-MOSFET) with a trench
contact on partly relatively lightly doped p-pillar is proposed and investigated by TCAD …