The Effect of Working Gas Admixture, Applied Voltage and Pressure on Focusing Time Parameter in the APF Plasma Focus Device

A Roomi, M Habibi - Journal of fusion energy, 2012 - Springer
In the present research the effects of key parameters, applied voltage, working gas
composition and pressure, on the focusing time in the APF plasma focus device are …

Study of a cumulative gas phenomenon in plasma focus discharge

HM Soliman, TM Allam… - Plasma Devices and …, 2009 - Taylor & Francis
A cumulative phenomenon of nitrogen gas at a pressure of 3.3 torr in a 1.2 kJ coaxial
plasma focus discharge device was investigated experimentally. Variations of nitrogen gas …