This review article aims to provide an updated and comprehensive description on the
development of atomic force microscopy (AFM) nanolithography for structuring and …

Manufacturing at the atomic scale is the next generation of the industrial revolution. Atomic
and close-to-atomic scale manufacturing (ACSM) helps to achieve this. Atomic force …

The production of high-performance solution-processed semiconductor films represents a
key materials challenge, potentially enabling a wide range of applications (eg, low-cost and …

Charge trapping properties of electrons and holes in ultrathin nitride-oxide-silicon (NOS)
structures were quantitatively determined by variable-temperature electrostatic force …

This paper investigates nanomachining of single-crystal silicon using an atomic force
microscope with a diamond-tip cantilever. To enable nanomachining of silicon, a …

Atomic force microscopy (AFM) was developed in 1986. It is an important and versatile
surface technique, and is used in many research fields. In this review, we have summarized …

Ionic liquids (ILs) are considered as a new kind of lubricant for micro/nanoelectromechanical
system (M/NEMS) due to their excellent thermal and electrical conductivity. However, so far …

Tribo-nanolithography (TNL) can form an affected layer on a silicon surface that is resistant
to corrosion by KOH, and a nanostructure can be fabricated by combination with wet …

The tribonanolithography (TNL) of silicon substrate in aqueous solution based on the use of
atomic force microscopy is demonstrated. A specially designed cantilever with a diamond …

This research aimed to investigate the feasibility of using direct amorphization of silicon
induced by femtosecond laser irradiation for maskless lithography. A thin layer of …