One-dimensional (1D) nanostructured materials for energy applications

A Machín, K Fontánez, JC Arango, D Ortiz, J De León… - Materials, 2021 - mdpi.com
At present, the world is at the peak of production of traditional fossil fuels. Much of the
resources that humanity has been consuming (oil, coal, and natural gas) are coming to an …

GaN-based diodes and transistors for chemical, gas, biological and pressure sensing

SJ Pearton, BS Kang, S Kim, F Ren… - Journal of Physics …, 2004 - iopscience.iop.org
There is renewed emphasis on development of robust solid-state sensors capable of
uncooled operation in harsh environments. The sensors should be capable of detecting …

Systems and methods for improved semiconductor etching and component protection

TF Tan, LK Loh, D Lubomirsky, J Soonwook… - US Patent …, 2019 - Google Patents
Semiconductor systems and methods may include a semiconductor processing chamber
having a gas box defining an access to the semiconductor processing chamber. The …

Systems and methods for improved semiconductor etching and component protection

TF Tan, LK Loh, D Lubomirsky, J Soonwook… - US Patent …, 2019 - Google Patents
Semiconductor systems and methods may include a semi conductor processing chamber
having a gas box defining an access to the semiconductor processing chamber. The cham …

Methods and systems to enhance process uniformity

S Singh, A Tso, J Zhang, Z Li, H Zhang… - US Patent …, 2023 - Google Patents
3, 969077 4006047 4, 190488 4.209. 357 4,214,946 4, 232060 4.234. 628 4,265.943
4,340,462 4,341,592 4,361,418 4,364,803 4,368.223 4, 374698 4,381,441 4,397,812 …

Dual-channel showerhead with improved profile

D Lubomirsky - US Patent 10,546,729, 2020 - Google Patents
Described processing chambers may include a chamber housing at least partially defining
an interior region of the semiconductor processing chamber. The chambers may include a …

Semiconductor processing systems having multiple plasma configurations

D Lubomirsky, X Chen, S Venkataraman - US Patent 10,256,079, 2019 - Google Patents
An exemplary system may include a chamber configured to contain a semiconductor
substrate in a processing region of the chamber. The system may include a first remote …

Generation of compact alumina passivation layers on aluminum plasma equipment components

SJ Kim, L Kalita, Y Pareek, A Kadam… - US Patent …, 2018 - Google Patents
A process for generating a compact alumina passivation layer on an aluminum component
includes rinsing the component in deionized water for at least one minute, drying it for at …

Conditioned semiconductor system parts

D Lubomirsky, SJ Kim - US Patent 9,885,117, 2018 - Google Patents
A method for conditioning a semiconductor chamber component may include passivating
the chamber component with an oxidizer. The method may also include performing a …

Method of forming vias in silicon carbide and resulting devices and circuits

Z Ring, ST Sheppard, H Hagleitner - US Patent 7,892,974, 2011 - Google Patents
(57) ABSTRACT A method of fabricating an integrated circuit on a silicon carbide substrate
is disclosed that eliminates wire bonding that can otherwise cause undesired inductance …