Heterogeneous integration of compound semiconductors

O Moutanabbir, U Gösele - Annual Review of Materials …, 2010 - annualreviews.org
The ability to tailor compound semiconductors and to integrate them onto foreign substrates
can lead to superior or novel functionalities with a potential impact on various areas in …

The phenomenology of ion implantation-induced blistering and thin-layer splitting in compound semiconductors

R Singh, SH Christiansen, O Moutanabbir… - Journal of electronic …, 2010 - Springer
Hydrogen and/or helium implantation-induced surface blistering and layer splitting in
compound semiconductors such as InP, GaAs, GaN, AlN, and ZnO are discussed. The …

Defect evolution in GaN thin film heterogeneously integrated with CMOS-compatible Si (100) substrate by ion-cutting technology

H Shi, A Yi, J Ding, X Liu, Q Qin, J Yi, J Hu… - Science China …, 2023 - Springer
Conclusion The defects and their thermo-evolution in the hetero-integrated GaN films on Si
(100) substrate were thoroughly studied. The nano-cavity defects and residual H ions in the …

Realization of wafer-scale single-crystalline GaN film on CMOS-compatible Si (100) substrate by ion-cutting technique

H Shi, K Huang, F Mu, T You, Q Ren, J Lin… - Semiconductor …, 2020 - iopscience.iop.org
Heterogeneous integration of gallium nitride (GaN) film on complementary metal-oxide-
semiconductor (CMOS)-compatible Si (100) substrate provides a material platform for future …

(Ultra) wide bandgap semiconductor heterostructures for electronics cooling

Z Cheng, Z Huang, J Sun, J Wang, T Feng… - Applied Physics …, 2024 - pubs.aip.org
The evolution of power and radiofrequency electronics enters a new era with (ultra) wide
bandgap semiconductors such as GaN, SiC, and β-Ga 2 O 3, driving significant …

Investigation on thermodynamics of ion-slicing of GaN and heterogeneously integrating high-quality GaN films on CMOS compatible Si (100) substrates

K Huang, Q Jia, T You, R Zhang, J Lin, S Zhang… - Scientific Reports, 2017 - nature.com
Die-to-wafer heterogeneous integration of single-crystalline GaN film with CMOS compatible
Si (100) substrate using the ion-cutting technique has been demonstrated. The …

Structures and optical properties of-implanted GaN epi-layers

BS Li, ZG Wang - Journal of Physics D: Applied Physics, 2015 - iopscience.iop.org
The implantation damage build-up and optical properties of GaN epitaxial films under $\text
{H} _ {2}^{+} $ ion implantation have been investigated by a combination of Rutherford …

[HTML][HTML] Wafer-scale fabrication of single-crystalline calcium fluoride thin-film on insulator by ion-cutting

Q Song, J Cai, C Wang, L Zhou, Y Chen, M Zhou… - Optical Materials, 2024 - Elsevier
Developing bulk materials into thin-films not only enables multiple physical fields to interact
strongly within a smaller volume but also enhances the stability, scalability, and integrability …

[HTML][HTML] Silicon-on-insulator with hybrid orientations for heterogeneous integration of GaN on Si (100) substrate

R Zhang, B Zhao, K Huang, T You, Q Jia, J Lin… - AIP Advances, 2018 - pubs.aip.org
Heterogeneous integration of materials pave a new way for the development of the
microsystem with miniaturization and complex functionalities. Two types of hybrid silicon on …

Bulk GaN ion cleaving

O Moutanabbir, U Gösele - Journal of electronic materials, 2010 - Springer
Bulk or freestanding GaN is a key material in various devices other than the blue laser
diodes. However, the high cost of bulk GaN wafers severely limits the large scale …