Hyperuniform monocrystalline structures by spinodal solid-state dewetting

M Salvalaglio, M Bouabdellaoui, M Bollani, A Benali… - Physical review …, 2020 - APS
Materials featuring anomalous suppression of density fluctuations over large length scales
are emerging systems known as disordered hyperuniform. The underlying hidden order …

Local uniaxial tensile strain in germanium of up to 4% induced by SiGe epitaxial nanostructures

M Bollani, D Chrastina, L Gagliano, L Rossetto… - Applied Physics …, 2015 - pubs.aip.org
We show that a relatively simple top-down fabrication can be used to locally deform
germanium in order to achieve uniaxial tensile strain of up to 4%. Such high strain values …

Selective area epitaxy of GaAs/Ge/Si nanomembranes: a morphological study

M Bollani, A Fedorov, M Albani, S Bietti… - Crystals, 2020 - mdpi.com
We demonstrate the feasibility of growing GaAs nanomembranes on a plastically-relaxed Ge
layer deposited on Si (111) by exploiting selective area epitaxy in MBE. Our results are …

Top–down SiGe nanostructures on Ge membranes realized by e-beam lithography and wet etching

V Mondiali, M Lodari, M Borriello, D Chrastina… - Microelectronic …, 2016 - Elsevier
SiGe nanostructures on Ge membranes have been fabricated by electron beam lithography
and anisotropic wet-chemical etching, starting from SiGe/Ge heterostructures epitaxially …

Influence of H2 on strain evolution of high-Sn-content Ge1−x Sn x alloys

J Zheng, W Huang, Z Liu, C Xue, C Li, Y Zuo… - Journal of Materials …, 2017 - Springer
Ge 1-x Sn x films with Sn content of up to 12% were grown on Ge substrates using
magnetron sputter epitaxy. The Ge 0.88 Sn 0.12 film grown in a pure Ar atmosphere was …

Micro and nanofabrication of SiGe/Ge bridges and membranes by wet-anisotropic etching

V Mondiali, M Lodari, D Chrastina, M Barget… - Microelectronic …, 2015 - Elsevier
Germanium bridges and membranes have been fabricated by lithography and wet-
anisotropic chemical etching from SiGe/Ge heterostructures epitaxially deposited on Si …

Functionalization of scanning probe tips with epitaxial semiconductor layers

V Giliberti, E Sakat, M Bollani, MV Altoe, M Melli… - Small …, 2017 - Wiley Online Library
Functionalized scanning probe tips hold great promise for the controlled delivery of signals
from and to selected nanoscale volumes. Here, a new nanotechnological approach for the …

Tensile strain in Ge membranes induced by SiGe nanostressors

MR Barget, M Lodari, M Borriello, V Mondiali… - Applied Physics …, 2016 - pubs.aip.org
The monolithic integration of photonic functionality into silicon microtechnology is widely
advanced. Yet, there is no final solution for the realization of a light source compatible with …

Strain release management in SiGe/Si films by substrate patterning

V Mondiali, M Bollani, D Chrastina, R Rubert… - Applied Physics …, 2014 - pubs.aip.org
The nucleation and the evolution of dislocations in SiGe/Si (001) films can be controlled and
confined along stripes aligned along pits carved in the substrate, leaving micrometric …

Anisotropic extended misfit dislocations in overcritical SiGe films by local substrate patterning

M Bollani, D Chrastina, R Ruggeri, G Nicotra… - …, 2016 - iopscience.iop.org
In this work we will show how local substrate patterning leads to a long range controlled
propagation of dislocations in SiGe films grown on Si (001) substrates. Dislocations …