Hyperuniform monocrystalline structures by spinodal solid-state dewetting
Materials featuring anomalous suppression of density fluctuations over large length scales
are emerging systems known as disordered hyperuniform. The underlying hidden order …
are emerging systems known as disordered hyperuniform. The underlying hidden order …
Local uniaxial tensile strain in germanium of up to 4% induced by SiGe epitaxial nanostructures
M Bollani, D Chrastina, L Gagliano, L Rossetto… - Applied Physics …, 2015 - pubs.aip.org
We show that a relatively simple top-down fabrication can be used to locally deform
germanium in order to achieve uniaxial tensile strain of up to 4%. Such high strain values …
germanium in order to achieve uniaxial tensile strain of up to 4%. Such high strain values …
Selective area epitaxy of GaAs/Ge/Si nanomembranes: a morphological study
We demonstrate the feasibility of growing GaAs nanomembranes on a plastically-relaxed Ge
layer deposited on Si (111) by exploiting selective area epitaxy in MBE. Our results are …
layer deposited on Si (111) by exploiting selective area epitaxy in MBE. Our results are …
Top–down SiGe nanostructures on Ge membranes realized by e-beam lithography and wet etching
SiGe nanostructures on Ge membranes have been fabricated by electron beam lithography
and anisotropic wet-chemical etching, starting from SiGe/Ge heterostructures epitaxially …
and anisotropic wet-chemical etching, starting from SiGe/Ge heterostructures epitaxially …
Influence of H2 on strain evolution of high-Sn-content Ge1−x Sn x alloys
J Zheng, W Huang, Z Liu, C Xue, C Li, Y Zuo… - Journal of Materials …, 2017 - Springer
Ge 1-x Sn x films with Sn content of up to 12% were grown on Ge substrates using
magnetron sputter epitaxy. The Ge 0.88 Sn 0.12 film grown in a pure Ar atmosphere was …
magnetron sputter epitaxy. The Ge 0.88 Sn 0.12 film grown in a pure Ar atmosphere was …
Micro and nanofabrication of SiGe/Ge bridges and membranes by wet-anisotropic etching
Germanium bridges and membranes have been fabricated by lithography and wet-
anisotropic chemical etching from SiGe/Ge heterostructures epitaxially deposited on Si …
anisotropic chemical etching from SiGe/Ge heterostructures epitaxially deposited on Si …
Functionalization of scanning probe tips with epitaxial semiconductor layers
Functionalized scanning probe tips hold great promise for the controlled delivery of signals
from and to selected nanoscale volumes. Here, a new nanotechnological approach for the …
from and to selected nanoscale volumes. Here, a new nanotechnological approach for the …
Tensile strain in Ge membranes induced by SiGe nanostressors
MR Barget, M Lodari, M Borriello, V Mondiali… - Applied Physics …, 2016 - pubs.aip.org
The monolithic integration of photonic functionality into silicon microtechnology is widely
advanced. Yet, there is no final solution for the realization of a light source compatible with …
advanced. Yet, there is no final solution for the realization of a light source compatible with …
Strain release management in SiGe/Si films by substrate patterning
The nucleation and the evolution of dislocations in SiGe/Si (001) films can be controlled and
confined along stripes aligned along pits carved in the substrate, leaving micrometric …
confined along stripes aligned along pits carved in the substrate, leaving micrometric …
Anisotropic extended misfit dislocations in overcritical SiGe films by local substrate patterning
In this work we will show how local substrate patterning leads to a long range controlled
propagation of dislocations in SiGe films grown on Si (001) substrates. Dislocations …
propagation of dislocations in SiGe films grown on Si (001) substrates. Dislocations …