Atomic layer deposition (ALD) is an ultra-thin film deposition technique that has found many
applications owing to its distinct abilities. They include uniform deposition of conformal films …

Driven by the growing demand for next-generation displays, the development of advanced
luminescent materials with exceptional photoelectric properties is rapidly accelerating, with …

Atomic layer deposition (ALD) is a technique of choice for a uniform, conformal coating of
substrates of complex geometries, owing to its characteristic self-limiting surface reactions …

Spatial atomic layer deposition (ALD) is a promising high-throughput technique capable of
producing ultrathin films on large substrates. Compared to flat wafers, deposition on …

A three-dimensional Computational Fluid Dynamics model is built for a commercial Atomic
Layer Deposition (ALD) reactor, designed to treat large area 20 cm substrates. The model …

In this paper, the 3D modeling and optimization of a commercial hot wall vertical reactor for
SiC coating is presented to investigate the effect of various process parameters on the …

ZnO deposition in porous γ‐Al2O3 via atomic layer deposition (ALD) is the critical first step
for the fabrication of zeolitic imidazolate framework membranes using the ligand‐induced …

The variation of the purge flow rate is investigated in a reactor scale simulation of a typical
atomic layer deposition (ALD) process. The investigation in its context addresses the …

Tremendous interest has been placed on the atomic layer deposition (ALD) process as a
thin film deposition technique capacity to deposit quality thin films. However, further …

Heat exchanger analysis is considered difficult because the determination of the overall heat
transfer coefficient is accompanied with high uncertainties. The uncertainties are due to …