This new edition of the bestselling Microlithography: Science and Technology provides a
balanced treatment of theoretical and operational considerations, from elementary concepts …

We present a comprehensive review and tutorial on emerging numerical electromagnetic
simulations of optical imaging systems based upon three-dimensional full-vector solutions of …

Lithography simulation is an increasingly important part of semiconductor manufacturing
due to the decreasing k1 value. It is not only required in lithography process development …

This thesis is concerned with methods for calculating scattered fields and aerial images in
photolithography. Several improvements to the Finite-Difference Time-Domain code …

Grayscale mask creation has for the most part been restricted to over-simplified optical and
resist models usually based on a contrast curve approach. While this technique has proven …

Photolithography is a common technique employed in the manufacture of Semiconductor
devices. Typically, a Semi conductor wafer is coated with a layer (film) of light Sensitive …

This paper presents a consistent and modularized approach to modeling projection optics.
Vector nature of light and polarization effect are considered from the very beginning at …

As the semiconductor industry looks to the future to extend manufacturing beyond 100nm,
ASML have developed a new implementation of an old optical method for lithography …

Optical lithography involves the creation of relief image patterns through the projection of
radiation within or near the ultraviolet (UV)-visible portion of the electromagnetic spectrum …

The application of scalar diffraction theory to a projection optics system is examined here for
somewhat higher numerical aperture conditions upon removing the paraxial, or small angle …