Polarity in GaN and ZnO: Theory, measurement, growth, and devices

J Zuniga-Perez, V Consonni, L Lymperakis… - Applied Physics …, 2016 - pubs.aip.org
The polar nature of the wurtzite crystalline structure of GaN and ZnO results in the existence
of a spontaneous electric polarization within these materials and their associated alloys (Ga …

Photoluminescence spectroscopy of crystalline semiconductors

GD Gilliland - Materials Science and Engineering: R: Reports, 1997 - Elsevier
The objective of this review article is to give an overview of the current state-of-the-art of
photoluminescence (PL) spectroscopy as a characterization tool in the study of …

Materials issues in high-brightness light-emitting diodes

GB Stringfellow - Semiconductors and semimetals, 1997 - Elsevier
Publisher Summary This chapter provides an overview of the basic issues involving the
materials used for high-brightness light emitting diodes (LEDs). It lays the fundamental …

Epitaxial growth and properties of cobalt-doped on single-crystal substrates

AC Tuan, JD Bryan, AB Pakhomov… - Physical Review B …, 2004 - APS
Co-doped ZnO (Co x Zn 1− x O) is of potential interest for spintronics due to the prediction of
room-temperature ferromagnetism. We have grown epitaxial Co x Zn 1− x O films on Al 2 O 3 …

[图书][B] The MOCVD Challenge: Volume 2: A Survey of GaInAsP-GaAs for photonic and electronic device applications

M Razeghi - 1995 - taylorfrancis.com
The MOCVD Challenge: Volume 2, A Survey of GaInAsP-GaAs for Photonic and Electronic
Device Applications focuses on GaAs systems and devices grown by MOCVD, specifically …

SIMS investigations into the effect of growth conditions on residual impurity and silicon incorporation in GaN and AlxGa1−xN

G Parish, S Keller, SP Denbaars, UK Mishra - Journal of Electronic …, 2000 - Springer
We have investigated the effect of metal-organic chemical vapour deposition growth
conditions on impurity incorporation in GaN and AlGaN. Secondary ion mass spectrometry …

Controlled carbon doping of GaAs by metalorganic vapor phase epitaxy

TF Kuech, MA Tischler, PJ Wang, G Scilla… - Applied physics …, 1988 - pubs.aip.org
The controlled incorporation of carbon has been demonstrated for the metalorganic vapor
phase epitaxy of GaAs. Carbon levels between 1016 and 1019 cm− 3 can be achieved …

Effect of thermal annealing on AlN films grown on sputtered AlN templates by metalorganic vapor phase epitaxy

R Yoshizawa, H Miyake… - Japanese Journal of …, 2017 - iopscience.iop.org
To obtain low-dislocation-density c-plane AlN on sapphire, we have studied the annealing of
AlN films at 1650 C. We prepared an AlN film with a thickness of 20 nm by radio-frequency …

[图书][B] The MOCVD Challenge: A survey of GaInAsP-InP and GaInAsP-GaAs for photonic and electronic device applications

M Razeghi - 2010 - taylorfrancis.com
Written by one of the driving forces in the field, The MOCVD Challenge is a comprehensive
review covering GaInAsP-InP, GaInAsP-GaAs, and related material for electronic and …

Organometallic precursors in the growth of epitaxial thin films of III-V semiconductors by metal-organic chemical vapor deposition (MOCVD)

P Zanella, G Rossetto, N Brianese, F Ossola… - Chemistry of …, 1991 - ACS Publications
Metal-organic chemical vapor deposition (MOCVD) can now be used routinely for the
preparation of a wide variety of groups III-V semiconductor materials. Ga-and In-based …