Enabling high performance n-type metal oxide semiconductors at low temperatures for thin film transistors
Amorphous oxide semiconductors have drawn considerable attention as a replacement for
ubiquitous silicon based technologies. By virtue of their flexible substrate compatibility and …
ubiquitous silicon based technologies. By virtue of their flexible substrate compatibility and …
High‐performance vacuum‐processed metal oxide thin‐film transistors: a review of recent developments
Since 2010, vacuum‐processed oxide semiconductors have greatly improved with the
publication of more than 1,300 related papers. Although the number of researches on oxide …
publication of more than 1,300 related papers. Although the number of researches on oxide …
Polythiophene–PCBM-based all-organic electrochromic device: fast and flexible
A fast and flexible all-organic electrochromic device, fabricated using polythiophene and
PCBM as active materials and plastic substrate, which shows very good power efficiency as …
PCBM as active materials and plastic substrate, which shows very good power efficiency as …
Prussian blue-viologen inorganic–organic hybrid blend for improved electrochromic performance
Electrochromic performance of an inorganic–organic layered blend consisting of prussian
blue and ethyl viologen has been studied in the form of a device designed to test its …
blue and ethyl viologen has been studied in the form of a device designed to test its …
Multifunctional oxygen scavenger layer for high-performance oxide thin-film transistors with low-temperature processing
In this study, the oxygen scavenger layer (OSL) is proposed as a back channel in the bilayer
channel to enhance both the electrical characteristics and stability of an amorphous indium …
channel to enhance both the electrical characteristics and stability of an amorphous indium …
Record-high-performance hydrogenated In–Ga–Zn–O flexible Schottky diodes
Y Magari, SGM Aman, D Koretomo… - … Applied Materials & …, 2020 - ACS Publications
High-performance In–Ga–Zn–O (IGZO) Schottky diodes (SDs) were fabricated using
hydrogenated IGZO (IGZO: H) at a maximum process temperature of 150° C. IGZO: H was …
hydrogenated IGZO (IGZO: H) at a maximum process temperature of 150° C. IGZO: H was …
Enhanced Electrical Properties and Stability in IGZO TFTs via Low-Temperature Activation with MgOx Layer
MS Kim, HT Kim, S Jung, YW Kim, S Lee… - ACS Applied Materials …, 2024 - ACS Publications
We propose the introduction of a magnesium oxide (MgO x) layer to reduce the temperature
required for the activation of indium gallium zinc oxide (IGZO) thin films. By incorporating the …
required for the activation of indium gallium zinc oxide (IGZO) thin films. By incorporating the …
Mesh-patterned IZO/Hf-doped IGZO thin film transistors with high mobility and mechanical stability for flexible display
KM Lee, N Kim, JK Lee, HJ Lee, SY Kim, TG Kim - Applied Surface Science, 2024 - Elsevier
Despite recent improvements in oxide-based thin-film transistors (TFTs), their performance
(ie, mobility and on/off ratio) must be further enhanced and the fabrication temperature must …
(ie, mobility and on/off ratio) must be further enhanced and the fabrication temperature must …
Effects of water and hydrogen introduction during In–Ga–Zn–O sputtering on the performance of low-temperature processed thin-film transistors
Y Magari, M Furura - Japanese Journal of Applied Physics, 2021 - iopscience.iop.org
Abstract In–Ga–Zn–O (IGZO) films were deposited by sputtering in Ar+ O 2+ H 2 and Ar+ H 2
O atmosphere to investigate the effects of H 2 and H 2 O introduction on physical and …
O atmosphere to investigate the effects of H 2 and H 2 O introduction on physical and …
Influence of oxygen-related defects on In-Ga-Sn-O semiconductor due to plasma-enhanced atomic layer deposition of Al2O3 for low-temperature thin-film transistor in …
Abstract In-Ga-Sn-O (IGTO) thin-film transistors (TFTs) were fabricated with Al 2 O 3 gate
insulators by plasma-enhanced atomic layer deposition (PEALD) at a temperature of 150° C …
insulators by plasma-enhanced atomic layer deposition (PEALD) at a temperature of 150° C …