[HTML][HTML] Heteroepitaxial growth of III-V semiconductors on silicon

JS Park, M Tang, S Chen, H Liu - Crystals, 2020 - mdpi.com
Monolithic integration of III-V semiconductor devices on Silicon (Si) has long been of great
interest in photonic integrated circuits (PICs), as well as traditional integrated circuits (ICs) …

[HTML][HTML] New approaches and understandings in the growth of cubic silicon carbide

FL Via, M Zimbone, C Bongiorno, A La Magna… - Materials, 2021 - mdpi.com
In this review paper, several new approaches about the 3C-SiC growth are been presented.
In fact, despite the long research activity on 3C-SiC, no devices with good electrical …

Integrated germanium optical interconnects on silicon substrates

P Chaisakul, D Marris-Morini, J Frigerio, D Chrastina… - Nature …, 2014 - nature.com
Monolithic integration of optoelectronics with electronics is a much-desired functionality.
Here, we demonstrate that it is possible to realize low-loss Ge quantum-well photonic …

[HTML][HTML] Wafer-scale Ge freestanding membranes for lightweight and flexible optoelectronics

T Hanuš, B Ilahi, A Chapotot, H Pelletier, J Cho… - Materials Today …, 2023 - Elsevier
Semiconductor-based freestanding membranes (FSM) have recently emerged as a highly
promising area of advanced materials research. Their unique properties, such as lightweight …

[PDF][PDF] Phase-change memory materials by design: a strain engineering approach

X Zhou, J Kalikka, X Ji, L Wu, Z Song, RE Simpson - Adv. Mater, 2016 - researchgate.net
DOI: 10.1002/adma. 201505865 sub-layer atoms seems necessary to complete the
transition, the energy barrier for the vertical atomic motion of Ge dominates the switching …

[HTML][HTML] On-chip infrared photonics with Si-Ge-heterostructures: What is next?

IA Fischer, M Brehm, M De Seta, G Isella, DJ Paul… - APL Photonics, 2022 - pubs.aip.org
The integration of Ge on Si for photonics applications has reached a high level of maturity:
Ge photodetectors are available on the Si platform in foundry processes, and Si/Ge …

Atomic scale strain relaxation in axial semiconductor III–V nanowire heterostructures

M de la Mata, C Magén, P Caroff, J Arbiol - Nano letters, 2014 - ACS Publications
Combination of mismatched materials in semiconductor nanowire heterostructures offers a
freedom of bandstructure engineering that is impossible in standard planar epitaxy …

[HTML][HTML] Nanowire LEDs grown directly on flexible metal foil

BJ May, ATM Sarwar, RC Myers - Applied Physics Letters, 2016 - pubs.aip.org
Using molecular beam epitaxy, self-assembled AlGaN nanowires are grown directly on Ta
and Ti foils. Scanning electron microscopy shows that the nanowires are locally textured …

[HTML][HTML] Uprooting defects to enable high-performance III–V optoelectronic devices on silicon

YA Bioud, A Boucherif, M Myronov, A Soltani… - Nature …, 2019 - nature.com
The monolithic integration of III-V compound semiconductor devices with silicon presents
physical and technological challenges, linked to the creation of defects during the deposition …

Faceting of equilibrium and metastable nanostructures: a phase-field model of surface diffusion tackling realistic shapes

M Salvalaglio, R Backofen… - Crystal Growth & …, 2015 - ACS Publications
Several crystalline structures are metastable or kinetically frozen out-of-equilibrium states in
the phase space. When the corresponding lifetime is sufficiently long, typical equilibrium …