[HTML][HTML] Review of inductively coupled plasmas: Nano-applications and bistable hysteresis physics

HC Lee - Applied Physics Reviews, 2018 - pubs.aip.org
Many different gas discharges and plasmas exhibit bistable states under a given set of
conditions, and the history-dependent hysteresis that is manifested by intensive quantities of …

Magnetic nozzle radiofrequency plasma thruster approaching twenty percent thruster efficiency

K Takahashi - Scientific reports, 2021 - nature.com
Abstract Development of a magnetic nozzle radiofrequency (rf) plasma thruster has been
one of challenging topics in space electric propulsion technologies. The thruster typically …

Inductively coupled plasma sources and applications

T Okumura - Physics Research International, 2010 - Wiley Online Library
The principle of inductively coupled plasma (ICP) and perspective of ICP development are
reviewed. Multispiral coil ICP (MSC‐ICP), which has the advantages of low inductance, high …

RF power transfer efficiency and plasma parameters of low pressure high power ICPs

D Zielke, S Briefi, U Fantz - Journal of Physics D: Applied Physics, 2021 - iopscience.iop.org
Inductively coupled radio frequency (RF) ion sources operating at 1 MHz under the condition
of a low gas pressure of 0.3 Pa are the basis of negative hydrogen/deuterium ionbased …

Miniaturization of inductively coupled plasma sources

Y Yin, J Messier, JA Hopwood - IEEE Transactions on plasma …, 1999 - ieeexplore.ieee.org
The scaling laws associated with the miniaturization of planar inductively coupled plasmas
(ICPs) are investigated. The applications for miniature ICPs include microelectromechanical …

A global (volume averaged) model of a nitrogen discharge: I. Steady state

EG Thorsteinsson… - Plasma Sources Science …, 2009 - iopscience.iop.org
A global (volume averaged) model is developed for a nitrogen discharge in the steady state
for the pressure range 1–100 mTorr. The electron energy distribution function is allowed to …

A three‐dimensional model for inductively coupled plasma etching reactors: azimuthal symmetry, coil properties, and comparison to experiments

MJ Kushner, WZ Collison, MJ Grapperhaus… - Journal of Applied …, 1996 - pubs.aip.org
Inductively coupled plasma (ICP) etching reactors are rapidly becoming the tool of choice for
low gas pressure, high plasma density etching of semiconductor materials. Due to their …

Effect of Ar addition to an plasma in an inductively coupled, traveling wave driven, large area plasma source: mixture plasma modeling and photoresist …

K Takechi, MA Lieberman - Journal of Applied Physics, 2001 - pubs.aip.org
We report on the effect of Ar addition to an O 2 plasma on photoresist etching in an
inductively coupled, traveling wave driven, large area plasma source (LAPS). We also …

[HTML][HTML] Diagnostics of RF coupling in H− ion sources as a tool for optimizing source design and operational parameters

S Briefi, D Zielke, D Rauner, U Fantz - Review of Scientific Instruments, 2022 - pubs.aip.org
Radio frequency (RF) driven H− ion sources are operated at very high power levels of up
100 kW in order to achieve the desired performance. For the experimental setup, these are …

2D simulations of inductive RF heating in the drivers of the SPIDER device

R Zagórski, D López-Bruna, E Sartori… - Fusion Engineering and …, 2023 - Elsevier
This paper presents the basic physical and numerical principles of a fluid model of the
negative ions source. The model gives self-consistent two-dimensional description of the …