A Perspective View of Silicon Based Classical to Non-Classical MOS Transistors and their Extension in Machine Learning

AP Singh, VK Mishra, S Akhter - Silicon, 2023 - Springer
Unprecedented growth in CMOS technology and demand of high-density integrated circuits
(ICs) in semiconductor industry has motivated to research community towards the …

A proof of concept for reliability aware analysis of junctionless negative capacitance FinFET-based hydrogen sensor

N Gandhi, RK Jaisawal, S Rathore… - Smart Materials and …, 2024 - iopscience.iop.org
This work demonstrates the reliability-aware analysis of the Junctionless negative
capacitance (NC) FinFET employed as a hydrogen (H 2) gas sensor. Gate stacking of the …

Analysis of thermal stability in underlap and overlap DMG FinFETs including self-heating effects

R Chaudhary, R Saha, M Yadav - Microelectronics Journal, 2024 - Elsevier
This work investigates the impact of the self-heating effect (SHE) on SOI Dual-Material Gate
(DMG) FinFETs with channel engineering including gate underlapped and overlapped …

Core-shell architecture and channel suppression: unleashing the potential of SC_RCS_DGJLFET

A Himral, R Sharma, M Agarwal - Physica Scripta, 2024 - iopscience.iop.org
In this investigation, a suppressed channel-rectangular core–shell double gate junctionless
field effect transistor (SC_RCS_DGJLFET) is simulated to enhance the junctionless device's …

Investigation of geometrical impact on a P+ buried negative capacitance SOI FET

T Santra, A Dixit, RK Jaisawal, S Rathore… - Microelectronics …, 2022 - Elsevier
In this paper, we proposed a novel p+ buried negative capacitance (NC) silicon-on-insulator
(SOI) FET and investigated the impact of various device parameter variations on device …

Device Design Aware and Interface Thermal Resistance Assisted Self-Heating Analysis in Nanosheet FET

S Rathore, SK Banchhor, RK Jaisawal… - 2022 IEEE …, 2022 - ieeexplore.ieee.org
The nanoscaled geometrical confinement of the Nanosheet FET (NSHFET) has severely
aggravated the self-heating effect, affecting the device's characteristics, such as lattice …

Role of Interfacial Oxide on Capacitance Matching in a Negative Capacitance FinFET: A Reliability Perspective

RK Jaisawal, S Rathore, PN Kondekar… - 2022 IEEE …, 2022 - ieeexplore.ieee.org
Capacitance matching is a prime requirement to realize a Negative Capacitance (NC) FET.
The ferroelectric (FE) layer in the gate stack with an interfacial oxide (IO) put forward two …