Microdroplet-tin plasma sources of EUV radiation driven by solid-state-lasers (Topical Review)

OO Versolato, J Sheil, S Witte, W Ubachs… - Journal of …, 2022 - iopscience.iop.org
Plasma produced from molten-tin microdroplets generates extreme ultraviolet light for state-
of-the-art nanolithography. Currently, CO 2 lasers are used to drive the plasma. In the future …

Physical processes in EUV sources for microlithography

VY Banine, KN Koshelev… - Journal of Physics D …, 2011 - iopscience.iop.org
The source is an integral part of an extreme ultraviolet lithography (EUVL) tool. Such a
source, as well as the EUVL tool, has to fulfil very high demands both technical and cost …

Spectroscopy of highly charged ions and its relevance to EUV and soft x-ray source development

G O'Sullivan, B Li, R D'Arcy, P Dunne… - Journal of Physics B …, 2015 - iopscience.iop.org
The primary requirement for the development of tools for extreme ultraviolet lithography
(EUVL) has been the identification and optimization of suitable sources. These sources must …

Extreme ultraviolet light from a tin plasma driven by a 2-µm-wavelength laser

L Behnke, R Schupp, Z Bouza, M Bayraktar… - Optics express, 2021 - opg.optica.org
An experimental study of laser-produced plasmas is performed by irradiating a planar tin
target by laser pulses, of 4.8 ns duration, produced from a KTP-based 2-µm-wavelength …

Optimization of extreme ultra-violet light emitted from the CO2 laser-irradiated tin plasmas using 2D radiation hydrodynamic simulations

A Sunahara, A Hassanein, K Tomita, S Namba… - Optics …, 2023 - opg.optica.org
We studied Extreme Ultra-Violet (EUV) emission characteristics of the 13.5 nm wavelength
from CO_2 laser-irradiated pre-formed tin plasmas using 2D radiation hydrodynamic …

Pure-tin microdroplets irradiated with double laser pulses for efficient and minimum-mass extreme-ultraviolet light source production

S Fujioka, M Shimomura, Y Shimada, S Maeda… - Applied Physics …, 2008 - pubs.aip.org
Laser-driven expansion of pure-tin microdroplets was demonstrated to produce an efficient
and low-debris extreme-ultraviolet (EUV) light source. The pre-expansion is indispensable …

Rare-earth plasma extreme ultraviolet sources at 6.5–6.7 nm

T Otsuka, D Kilbane, J White, T Higashiguchi… - Applied Physics …, 2010 - pubs.aip.org
We have demonstrated a laser-produced plasma extreme ultraviolet source operating in the
6.5–6.7 nm region based on rare-earth targets of Gd and Tb coupled with a Mo/B 4 C …

Time-resolved two-dimensional profiles of electron density and temperature of laser-produced tin plasmas for extreme-ultraviolet lithography light sources

K Tomita, Y Sato, S Tsukiyama, T Eguchi, K Uchino… - Scientific reports, 2017 - nature.com
Abstract Time-resolved two-dimensional (2D) profiles of electron density (ne) and electron
temperature (T e) of extreme ultraviolet (EUV) lithography light source plasmas were …

Modeling of radiative properties of Sn plasmas for extreme-ultraviolet source

A Sasaki, A Sunahara, H Furukawa… - Journal of Applied …, 2010 - pubs.aip.org
Atomic processes in Sn plasmas are investigated for application to extreme-ultraviolet (EUV)
light sources used in microlithography. We develop a full collisional radiative (CR) model of …

Characteristics of extreme ultraviolet emission from mid-infrared laser-produced rare-earth Gd plasmas

T Higashiguchi, B Li, Y Suzuki, M Kawasaki… - Optics …, 2013 - opg.optica.org
We characterize extreme ultraviolet (EUV) emission from mid-infrared (mid-IR) laser-
produced plasmas (LPPs) of the rare-earth element Gd. The energy conversion efficiency …