Emerging trends in wide band gap semiconductors (SiC and GaN) technology for power devices

F Roccaforte, P Fiorenza, G Greco, RL Nigro… - Microelectronic …, 2018 - Elsevier
Among the wide band gap (WBG) semiconductors, silicon carbide (4H-SiC) and gallium
nitride (GaN) are nowadays recognized as outstanding materials for the future of power …

Nanoscale transport properties at silicon carbide interfaces

F Roccaforte, F Giannazzo… - Journal of Physics D …, 2010 - iopscience.iop.org
Wide bandgap semiconductors promise devices with performances not achievable using
silicon technology. Among them, silicon carbide (SiC) is considered the top-notch material …

Inversion layer carrier concentration and mobility in 4H–SiC metal-oxide-semiconductor field-effect transistors

S Dhar, S Haney, L Cheng, SR Ryu… - Journal of Applied …, 2010 - pubs.aip.org
Free electron concentration and carrier mobility measurements on 4H–SiC metal-oxide-
semiconductor inversion layers are reported in this article. The key finding is that in state-of …

Limiting mechanism of inversion channel mobility in Al-implanted lateral 4H-SiC metal-oxide semiconductor field-effect transistors

A Frazzetto, F Giannazzo, P Fiorenza, V Raineri… - Applied Physics …, 2011 - pubs.aip.org
The mechanism limiting the channel mobility in metal-oxide-semiconductor field-effect
transistors (MOSFETs) fabricated in Al-implanted 4H-SiC is discussed comparing different …

Critical issues for interfaces to p-type SiC and GaN in power devices

F Roccaforte, A Frazzetto, G Greco, F Giannazzo… - Applied Surface …, 2012 - Elsevier
Silicon carbide (SiC) and gallium nitride (GaN) are excellent wide band gap materials for
power electronics. In spite of the significant progresses achieved in the last years, there are …

1200-V 5.2- 4H-SiC BJTs With a High Common-Emitter Current Gain

HS Lee, M Domeij, CM Zetterling… - IEEE Electron …, 2007 - ieeexplore.ieee.org
This letter presents fabrication of a power 4H-SiC bipolar junction transistor (BJT) with a high
open-base breakdown voltage BV CEO ap 1200 V, a low specific on-resistance R SP_ON …

The current status and the future prospects of surface passivation in 4H-SiC transistors

A Siddiqui, H Elgabra, S Singh - IEEE Transactions on Device …, 2016 - ieeexplore.ieee.org
The degraded performance of 4H-SiC transistors due to a high density of the SiC/SiO 2
interface states (D IT)(~ 10 12-10 13 eV-1 cm-2) has gained increasing attention in recent …

Synergistic passivation effects of nitrogen plasma and oxygen plasma on improving the interface quality and bias temperature instability of 4H-SiC MOS capacitors

C Yang, Z Yin, F Zhang, Y Su, F Qin, D Wang - Applied Surface Science, 2020 - Elsevier
Interface properties and bias temperature instability (BTI) determine the performance and
stability of SiC metal-oxide semiconductor (MOS) devices. In this work, we propose an …

Influence of the surface morphology on the channel mobility of lateral implanted 4H-SiC (0001) metal-oxide-semiconductor field-effect transistors

P Fiorenza, F Giannazzo, A Frazzetto… - Journal of Applied …, 2012 - pubs.aip.org
The influence of the surface morphology on the channel mobility of 4H-SiC metal-oxide-
semiconductor field effect transistors annealed under two different conditions is discussed …

Surface passivation oxide effects on the current gain of 4H-SiC bipolar junction transistors

HS Lee, M Domeij, CM Zetterling, M Östling… - Applied Physics …, 2008 - pubs.aip.org
Effects of surface recombination on the common emitter current gain have been studied in 4
H-silicon carbide (SiC) bipolar junction transistors (BJTs) with passivation formed by …