Systems, devices, and/or methods for manufacturing castings

M Appleby, I Fraser, J Paulus - US Patent 9,315,663, 2016 - Google Patents
2021-03-04 Assigned to RAYTHEON TECHNOLOGIES CORPORATION reassignment
RAYTHEON TECHNOLOGIES CORPORATION CORRECTIVE ASSIGNMENT TO …

Step and repeat imprint lithography processes

SV Sreenivasan, BJ Choi, NE Schumaker… - US Patent …, 2006 - Google Patents
The present invention is directed to methods for patterning a substrate by imprint
lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate …

Materials for imprint lithography

FY Xu, MPC Watts, NA Stacey - US Patent 8,076,386, 2011 - Google Patents
The present invention is directed to a material for use in imprint lithography that features a
composition having a viscosity associated therewith and including a surfactant, a …

Methods for manufacturing three-dimensional devices and devices created thereby

MP Appleby, I Fraser, JE Atkinson - US Patent 7,410,606, 2008 - Google Patents
(57) ABSTRACT A process of making a casting includes the steps of designing a mold
(1010), fabricating the layers (or laminations) of the mold (1020), Stacking and assembling …

Devices, methods, and systems involving castings

M Appleby, I Fraser, JE Atkinson - US Patent 7,141,812, 2006 - Google Patents
Primary Examiner David A. Vanore Related US Application Data(74) Attorney, Agent, or Firm
Michael Haynes PLC:(63) Continuation-in-part of application No. 10/282,441, Michael N …

Method to arrange features on a substrate to replicate features having minimal dimensional variability

SV Sreenivasan, MPC Watts - US Patent 8,349,241, 2013 - Google Patents
The present invention is directed to a method of and a mold for arranging features on a
substrate to replicate the features with minimal dimensional variability. The method includes …

Method to reduce adhesion between a conformable region and a pattern of a mold

BJ Choi, FY Xu, NA Stacey, MPC Watts - US Patent 7,157,036, 2007 - Google Patents
The present invention provides a method to reduce adhesion between a conformable region
on a substrate and a pattern of a mold, which selectively comes into contact with the …

Alignment methods for imprint lithography

SV Sreenivasan, MPC Watts, BJ Choi… - US Patent …, 2005 - Google Patents
Described are methods for patterning a Substrate by imprint lithography. Imprint lithography
is a proceSS in which a liquid is dispensed onto a Substrate. A template is brought into …

Formation of microstructures using a preformed photoresist sheet

H Guckel, TR Christenson, K Skrobis - US Patent 5,378,583, 1995 - Google Patents
3,336,534 5/1975 Cook, Jr_ et a1_. In the formation of m1crostructures, a preformed sheet
3,984,582 10/1976 Feder et a1.. of phot0res1st, such as polymethylmethacrylate 4,035,522 …

Method of forming stepped structures employing imprint lithography

SV Sreenivasan - US Patent 7,396,475, 2008 - Google Patents
US7396475B2 - Method of forming stepped structures employing imprint lithography - Google
Patents US7396475B2 - Method of forming stepped structures employing imprint lithography …