Progress on the intrinsic a-Si: H films for interface passivation of silicon heterojunction solar cells: A review

J Panigrahi, VK Komarala - Journal of Non-Crystalline Solids, 2021 - Elsevier
Amorphous/crystalline silicon heterojunction (SHJ) solar cells are well known for their
inherent high open-circuit voltage (V OC) potential, much better temperature coefficient …

Electromagnetic effects in high-frequency capacitive discharges used for plasma processing

P Chabert - Journal of Physics D: Applied Physics, 2007 - iopscience.iop.org
In plasma processing, capacitive discharges have classically been operated in the
electrostatic regime, for which the excitation wavelength λ is much greater than the electrode …

The energy balance at substrate surfaces during plasma processing

H Kersten, H Deutsch, H Steffen, GMW Kroesen… - Vacuum, 2001 - Elsevier
A summary is given of different elementary processes influencing the thermal balance and
energetic conditions of substrate surfaces during plasma processing. The discussed …

Fundamentals of pulsed plasmas for materials processing

A Anders - Surface and coatings technology, 2004 - Elsevier
Pulsed plasmas use much higher power during each pulse compared to continuously
operated plasmas. This feature and the appearance of additional new variables such as …

Improving plasma uniformity using lens-shaped electrodes in a large area very high frequency reactor

H Schmidt, L Sansonnens, AA Howling… - Journal of applied …, 2004 - pubs.aip.org
Experiments using a lens-shaped circular electrode are described to measure the correction
of plasma nonuniformity due to the standing wave effect in a large area very high frequency …

Ion energy uniformity in high-frequency capacitive discharges

A Perret, P Chabert, J Jolly, JP Booth - Applied Physics Letters, 2005 - pubs.aip.org
Ion energy distribution functions and ion fluxes in low-pressure, high-frequency (13.56–80
MHz) capacitive discharges were investigated both theoretically and experimentally. In most …

Influence of excitation frequency on the metastable atoms and electron energy distribution function in a capacitively coupled argon discharge

S Sharma, N Sirse, MM Turner, AR Ellingboe - Physics of Plasmas, 2018 - pubs.aip.org
One-dimensional particle-in-cell simulation is used to simulate the capacitively coupled
argon plasma for a range of excitation frequency from 13.56 MHz to 100 MHz. The argon …

Development of high efficiency large area silicon thin film modules using VHF-PECVD

H Takatsuka, M Noda, Y Yonekura, Y Takeuchi… - Solar Energy, 2004 - Elsevier
This paper reviews recent work on the development of thin film silicon solar modules and
cost-effective production technology. Noting the potential of VHF-PECVD for high rate and …

[HTML][HTML] Magnetic field induced electron temperature inhomogeneity effects on discharge properties in cylindrical capacitively coupled plasmas

S Dahiya, P Singh, S Das, N Sirse, SK Karkari - Physics Letters A, 2023 - Elsevier
This paper presents the discharge properties of a novel cylindrical Capacitively Coupled
Plasma (CCP) discharge with an axisymmetric magnetic field. It is observed that with an …

Possible solution to the problem of high built-up stresses in diamond-like carbon films

S Kumar, PN Dixit, D Sarangi… - Journal of applied …, 1999 - pubs.aip.org
The various issues relating to the nature of high built-up stresses in diamond like carbon
(DLC) films are presented and analyzed and the utility of pulse plasma technique in growing …