[HTML][HTML] Modeling of diffuse reflectance for a two layered medium: A Monte-Carlo study
A Shahin - Results in Optics, 2024 - Elsevier
A simple exponential model of diffuse reflectance for a two-layered medium was developed
theoretically based on Monte Carlo simulation. Absorption and reduced scattering …
theoretically based on Monte Carlo simulation. Absorption and reduced scattering …
Improvement of Reflectance Spectroscopy for Oxide Layers on 4H-SiC
J Koerfer, M Rommel, A Fuchs, O Rusch - Solid State Phenomena, 2024 - Trans Tech Publ
In this work, we investigate the use of reflectance spectroscopy as an accurate, fast, and non-
destructive method for measuring the thickness of transparent layers, such as SiO2, with …
destructive method for measuring the thickness of transparent layers, such as SiO2, with …
Laser-based thickness control in a double-side polishing system for silicon wafers
Thickness control is a critical process of automated polishing of large and thin Si wafers in
the semiconductor industry. In this paper, an elaborate double-side polishing (DSP) system …
the semiconductor industry. In this paper, an elaborate double-side polishing (DSP) system …
[PDF][PDF] Results in Optics
A Shahin - researchgate.net
ABSTRACT A simple exponential model of diffuse reflectance for a two-layered medium was
developed theoretically based on Monte Carlo simulation. Absorption and reduced …
developed theoretically based on Monte Carlo simulation. Absorption and reduced …