Insulated gate and surface passivation structures for GaN-based power transistors

Z Yatabe, JT Asubar, T Hashizume - Journal of Physics D …, 2016 - iopscience.iop.org
Recent years have witnessed GaN-based devices delivering their promise of
unprecedented power and frequency levels and demonstrating their capability as an able …

State of the art on gate insulation and surface passivation for GaN-based power HEMTs

T Hashizume, K Nishiguchi, S Kaneki, J Kuzmik… - Materials science in …, 2018 - Elsevier
In this article, we review recent progress on AlGaN/GaN and InAlN/GaN metal-insulator-
semiconductor high-electron-mobility transistors (MIS-HEMTs) using Al-based oxides, nitride …

GaN-based power devices: Physics, reliability, and perspectives

M Meneghini, C De Santi, I Abid, M Buffolo… - Journal of Applied …, 2021 - pubs.aip.org
Over the last decade, gallium nitride (GaN) has emerged as an excellent material for the
fabrication of power devices. Among the semiconductors for which power devices are …

The 2018 GaN power electronics roadmap

H Amano, Y Baines, E Beam, M Borga… - Journal of Physics D …, 2018 - iopscience.iop.org
Gallium nitride (GaN) is a compound semiconductor that has tremendous potential to
facilitate economic growth in a semiconductor industry that is silicon-based and currently …

Negative bias-induced threshold voltage instability in GaN-on-Si power HEMTs

M Meneghini, I Rossetto, D Bisi… - IEEE Electron …, 2016 - ieeexplore.ieee.org
This letter reports an in-depth study of the negative threshold voltage instability in GaN-on-Si
metal-insulator–semiconductor high electron mobility transistors with partially recessed …

Investigation of In Situ SiN as Gate Dielectric and Surface Passivation for GaN MISHEMTs

H Jiang, C Liu, Y Chen, X Lu… - IEEE Transactions on …, 2017 - ieeexplore.ieee.org
In this paper, we present a systematic investigation of metal–organic chemical vapor
deposition-grown in situ SiN as the gate dielectric and surface passivation for AlGaN/GaN …

Ultralow-contact-resistance Au-free ohmic contacts with low annealing temperature on AlGaN/GaN heterostructures

J Zhang, X Kang, X Wang, S Huang… - IEEE Electron …, 2018 - ieeexplore.ieee.org
We report on the electrical and microstructural characterization of Au-free Ti/Al/Ti/TiN
contacts for AlGaN/GaN heterostructures. Ultra-low Au-free ohmic contact has been …

Characterization of electronic states at insulator/(Al) GaN interfaces for improved insulated gate and surface passivation structures of GaN-based transistors

Z Yatabe, Y Hori, WC Ma, JT Asubar… - Japanese Journal of …, 2014 - iopscience.iop.org
This paper presents a systematic characterization of electronic states at insulators/(Al) GaN
interfaces, particularly focusing on insulator/AlGaN/GaN structures. First, we review …

Au-free low temperature ohmic contacts for AlGaN/GaN power devices on 200 mm Si substrates

A Firrincieli, B De Jaeger, S You… - Japanese Journal of …, 2014 - iopscience.iop.org
We report on the fabrication and characterization of Au-free Ti/Al/TiN-based ohmic contacts
on 200 mm AlGaN/GaN epilayers for power devices. Materials and processing used are fully …

Status of aluminum oxide gate dielectric technology for insulated-gate GaN-based devices

A Calzolaro, T Mikolajick, A Wachowiak - Materials, 2022 - mdpi.com
Insulated-gate GaN-based transistors can fulfill the emerging demands for the future
generation of highly efficient electronics for high-frequency, high-power and high …